Design of a disulfide bond-containing photoresist with extremely low volume shrinkage and excellent degradation ability for UV-nanoimprinting lithography
2020 ◽
Vol 390
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pp. 124625
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2018 ◽
Vol 5
(7)
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pp. 076402
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1996 ◽
Vol 107
(1)
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pp. 125-138
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2016 ◽
Vol 4
(2)
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pp. 512-518
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Keyword(s):
2019 ◽
Vol 129
◽
pp. 96-100
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Keyword(s):
2017 ◽
Vol 24
(5)
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pp. 1303-1307
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Keyword(s):
Keyword(s):