Nano fabrication of star structure for precision metrology developed by focused ion beam direct writing

CIRP Annals ◽  
2012 ◽  
Vol 61 (1) ◽  
pp. 511-514 ◽  
Author(s):  
Zongwei Xu ◽  
Fengzhou Fang ◽  
Haifeng Gao ◽  
Yibo Zhu ◽  
Wei Wu ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Direct Writing ◽  
Nano Fabrication ◽  
Precision Metrology ◽  
Star Structure

Focused Ion Beam Etching of Nanometer-Size GaN/AlGaN Device Structures and their Optical Characterization by Micro-Photoluminescence/Raman Mapping

1999 ◽  
Vol 595 ◽  
Author(s):  
M. Kuball ◽  
M. Benyoucef ◽  
F.H. Morrissey ◽  
C.T. Foxon
Keyword(s):  
Field Effect Transistor ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Device Structure ◽  
Ion Beam Etching ◽  
Nanometer Size ◽  
Nano Fabrication ◽  
Micro Raman Spectroscopy ◽  
Device Structures ◽  
Effect Transistor

AbstractWe report on the nano-fabrication of GaN/AlGaN device structures using focused ion beam (FIB) etching, illustrated on a GaN/AlGaN heterostructure field effect transistor (HFET). Pillars as small as 20nm to 300nm in diameter were fabricated from the GaN/AlGaN HFET. Micro-photoluminescence and UV micro-Raman maps were recorded from the FIB-etched pattern to assess its material quality. Photoluminescence was detected from 300nm-size GaN/AlGaN HFET pillars, i.e., from the AlGaN as well as the GaN layers in the device structure, despite the induced etch damage. Properties of the GaN and the AlGaN layers in the FIB-etched areas were mapped using UV Micro-Raman spectroscopy. Damage introduced by FIB-etching was assessed. The fabricated nanometer-size GaN/AlGaN structures were found to be of good quality. The results demonstrate the potential of FIB-etching for the nano-fabrication of III-V nitride devices.

Focused Ion Beam Nano-Machined Structures For Strain Analysis By A Moiré Technique

2002 ◽  
Vol 761 ◽  
Author(s):  
Biao Li ◽  
Huimin Xie ◽  
Xin Zhang
Keyword(s):  
Focused Ion Beam ◽  
Microelectromechanical Systems ◽  
Ion Beam ◽  
Accurate Determination ◽  
Strain Analysis ◽  
Local Strain ◽  
Ion Milling ◽  
Nano Fabrication ◽  
In Situ Deposition ◽  
Potential Applications

ABSTRACTThe accurate determination of residual stress/strain in thin films is especially important in the emerging field of MicroElectroMechanical Systems (MEMS). In this article, a focused ion beam (FIB) moiré method is proposed and demonstrated to measure the strain in MEMS structures. This technique is based on the advantages of the FIB system in nano-fabrication, imaging, in-situ deposition, and fine adjustment. Nano-grating lines with 70 nm width and 140 nm spacing are directly written on the top of the MEMS structures by ion milling without the requirement of an etch mask. The FIB moiré pattern is formed by the interference between a prepared specimen grating and FIB raster scan lines. The strain of the MEMS structures is derived by calculating the average spacing of moiré fringes. Since the local strain of a MEMS structure itself can be monitored during the process, the FIB moiré technique has many potential applications in the mechanical metrology of MEMS. As an example, the strain distribution along the sticking MEMS structures, and the contribution of surface oxidization and mass loading to the cantilever strain is determined by this FIB moiré technique.

Nano-photomask fabrication using focused ion beam direct writing

CIRP Annals ◽  
2010 ◽  
Vol 59 (1) ◽  
pp. 543-546 ◽  
Author(s):  
F.Z. Fang ◽  
Z.W. Xu ◽  
X.T. Hu ◽  
C.T. Wang ◽  
X.G. Luo ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Direct Writing

Modeling and Simulation of Focused Ion Beam Based Single Digital Nano Hole Fabrication for DNA and Macromolecule Characterization

2008 ◽  
Author(s):  
Jack Zhou ◽  
Guoliang Yang
Keyword(s):  
Thin Film ◽  
Focused Ion Beam ◽  
Electrochemical Etching ◽  
Ion Beam ◽  
Machining Process ◽  
Single Digit ◽  
Nano Fabrication ◽  
Dna And Rna ◽  
Epitaxial Deposition ◽  
Micro Holes

In this paper we describe a top down nano-fabrication method to make single-digit nanoholes that we aim to use for DNA and RNA characterization. There are three major steps towards the fabrication of a single-digit nanohole. 1) Preparing the freestanding thin film by epitaxial deposition and electrochemical etching. 2) Making sub-micro holes (0.2 μm to 0.02μm) by focused ion beam (FIB), electron beam (EB), atomic force microscope (AFM), or other methods. 3) Reducing the hole to less than 10 nm by epitaxial deposition, FIB or EB induced deposition. One specific aim for this paper is to model, simulate and control the focused ion beam machining process to fabricate holes which can reach single-digit nanometer scale on solid-state thin films. Preliminary work has been done on the thin film (30 nm in thickness) preparation, sub-micron hole fabrication, and ion beam induced deposition, and results are presented.

scholarly journals Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties

APL Materials ◽  
2018 ◽  
Vol 6 (6) ◽  
pp. 060701 ◽  
Author(s):  
Michal Urbánek ◽  
Lukáš Flajšman ◽  
Viola Křižáková ◽  
Jonáš Gloss ◽  
Michal Horký ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Focused Ion Beam ◽  
Ion Beam ◽  
Direct Writing ◽  
Structural And Magnetic Properties

Direct writing of gold nanostructures using a gold‐cluster compound and a focused‐ion beam

1993 ◽  
Vol 74 (12) ◽  
pp. 7588-7591 ◽  
Author(s):  
P. Hoffmann ◽  
G. Ben Assayag ◽  
J. Gierak ◽  
J. Flicstein ◽  
M. Maar‐Stumm ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Gold Cluster ◽  
Ion Beam ◽  
Gold Nanostructures ◽  
Cluster Compound ◽  
Direct Writing

scholarly journals Nano-fabrication and Functionalization of Crosslinked PTFE Using Focused Ion Beam

2009 ◽  
Vol 22 (3) ◽  
pp. 341-345 ◽  
Author(s):  
Yuya Takasawa ◽  
Naoyuki Fukutake ◽  
Kazumasa Okamoto ◽  
Akihiro Oshima ◽  
Seiichi Tagawa ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Nano Fabrication

scholarly journals Three-Dimensional Superconducting Nanohelices Grown by He+-Focused-Ion-Beam Direct Writing

Nano Letters ◽  
2019 ◽  
Vol 19 (12) ◽  
pp. 8597-8604 ◽  
Author(s):  
Rosa Córdoba ◽  
Dominique Mailly ◽  
Roman O. Rezaev ◽  
Ekaterina I. Smirnova ◽  
Oliver G. Schmidt ◽  
...  
Keyword(s):  
Focused Ion Beam ◽  
Ion Beam ◽  
Three Dimensional ◽  
Direct Writing
Sign in / Sign up

Export Citation Format

Share Document