Fabrication of single-crystal silicon micro pillars on copper foils by nanosecond pulsed laser irradiation

CIRP Annals ◽  
2017 ◽  
Vol 66 (1) ◽  
pp. 253-256 ◽  
Author(s):  
Jiwang Yan ◽  
Jun Noguchi ◽  
Yoshitake Terashi
1991 ◽  
Vol 235 ◽  
Author(s):  
Randall J. Carolissen ◽  
R. Pretorius

ABSTRACTSevere oxidation inhibited epitaxy when buried Sb profiles in single crystal silicon were formed from evaporated layers irradiated in atmosphere with a pulsed Q-switched ruby laser. Oxygen concentrations as high as 5×1017atoms/cm2 (equivalent to 105nm SiO2) were measured. However, structures prepared without the Sb layer and irradiated under identical conditions, showed no oxidation. Oxidation of Sb as a source of the measured oxygen was ruled out, while the total heating time during laser irradiation is so short (nano- to milliseconds) that normal oxidation kinetics cannot account for the amount of SiO2 measured. Irradiations in vacuum and in a helium ambient showed that the oxygen responsible for these effects is supplied from the ambient in which irradiations are carried out. Also no oxidation was observed when structures, prepared on a substrate heated to 350°C, were irradiated in atmosphere. A model to account for these oxidation effects is proposed.


2014 ◽  
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Author(s):  
Tuğrul Özel ◽  
Thanongsak Thepsonthi ◽  
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George K. Celler

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pp. 157-161 ◽  
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Y. Yoshida ◽  
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...  

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