Layer number dependence of carrier lifetime in graphenes observed using time-resolved mid-infrared luminescence

2015 ◽  
Vol 637 ◽  
pp. 58-62 ◽  
Author(s):  
Hiroshi Watanabe ◽  
Tomohiro Kawasaki ◽  
Takushi Iimori ◽  
Fumio Komori ◽  
Tohru Suemoto
2021 ◽  
Vol 560 ◽  
pp. 120718
Author(s):  
Mingyang Sun ◽  
Anping Yang ◽  
He Ren ◽  
Sisheng Qi ◽  
Huixing Lin ◽  
...  

Nanoscale ◽  
2021 ◽  
Author(s):  
Mithun K P ◽  
Srabani Kar ◽  
Abinash Kumar ◽  
Victor Suvisesha Muthu Dharmaraj ◽  
Ravishankar Narayanan ◽  
...  

Collective excitation of Dirac plasmons in graphene and topological insulators have opened new possibilities of tunable plasmonic materials ranging from THz to mid-infrared regions. Using time resolved Optical Pump -...


2003 ◽  
Vol 770 ◽  
Author(s):  
N.Q. Vinh ◽  
T. Gregorkiewicz

AbstractOne of the open questions in semiconductor physics is the origin of the small splittings of the excited states of bound excitons in silicon. A free electron laser as a tunable source of the mid-infrared radiation (MIR) can be used to investigate such splittings of the excited states of optical centers created by transition metal dopants in silicon. In the current study, the photoluminescence from silver and copper doped silicon is investigated by two color spectroscopy in the visible and the MIR. It is shown the PL due recombination of exciton bound to Ag and Cu is quenched upon application of the MIR beam. The time-resolved photoluminescence measurements and the quenching effects of these bands are presented. By scanning the wavelength of the free-electron laser ionization spectra of relevant traps involved in photoluminescence are obtained. The formation and dissociation of the bound excitons, and the small splittings of the effective-mass excited states are discussed. The applied experimental method allows correlation of DLTS data on trapping centers to specific channels of radiative recombination. It can be applied for spectroscopic analysis in materials science of semicondutors.


2D Materials ◽  
2016 ◽  
Vol 3 (4) ◽  
pp. 041006 ◽  
Author(s):  
Ryan J Suess ◽  
Edward Leong ◽  
Joseph L Garrett ◽  
Tong Zhou ◽  
Reza Salem ◽  
...  

Author(s):  
Muhammad Ali Abbas ◽  
Luuk van Dijk ◽  
Khalil Eslami Jahromi ◽  
Mohammadreza Nematollahi ◽  
Frans J. M. Harren ◽  
...  

2016 ◽  
Vol 431 ◽  
pp. 79-82 ◽  
Author(s):  
Jing Wang ◽  
Jihong Zhang ◽  
Chao Liu ◽  
Jong Heo ◽  
Yong Kon Kwon

Author(s):  
Д.В. Юрасов ◽  
Н.А. Байдакова ◽  
А.Н. Яблонский ◽  
А.В. Новиков

Light-emitting properties of Ge-on-Si(001) layers doped by Sb were studied by stationary and time-resolved photoluminescence (PL) at room temperature. It was obtained that the PL intensity of n-Ge/Si(001) structures is maximized when the doping level is close to the equilibrium solubility of Sb in Ge (~1019 cm-3) which is in accordance with the previously published data. Time-resolved studies of the direct-related PL signal have shown that both the donor density and the growth conditions of doped layer, in particular, the growth temperature influence the PL kinetics. It was obtained that the increase of doping level leads to the decrease of the characteristic carrier lifetime. Moreover, usage of low growth temperatures which is needed to form the doped n-Ge layers also results in shortening of the carrier lifetime as compared with Ge layers grown at high temperatures. It was found that rapid thermal anneal at proper conditions could partially compensate the above mentioned detrimental effects and lead to the increase of both the PL intensity and carrier lifetime.


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