scholarly journals Low-temperature Surface Passivation of Moderately Doped Crystalline Silicon by Atomic-layer-deposited Hafnium Oxide Films

2012 ◽  
Vol 15 ◽  
pp. 84-90 ◽  
Author(s):  
F. Lin ◽  
B. Hoex ◽  
Y.H. Koh ◽  
J.J. Lin ◽  
A.G. Aberle
RSC Advances ◽  
2016 ◽  
Vol 6 (100) ◽  
pp. 97720-97727 ◽  
Author(s):  
Rajbir Singh ◽  
Vandana Vandana ◽  
Jagannath Panigrahi ◽  
P. K. Singh

Plasma assisted ALD deposited hafnium oxide films are studied for silicon surface passivation. SRV < 40 cm s−1 are realized under optimised conditions.


2002 ◽  
Vol 92 (10) ◽  
pp. 5698-5703 ◽  
Author(s):  
Kaupo Kukli ◽  
Mikko Ritala ◽  
Jonas Sundqvist ◽  
Jaan Aarik ◽  
Jun Lu ◽  
...  

2013 ◽  
Vol 123 (5) ◽  
pp. 899-903 ◽  
Author(s):  
R. Ratajczak ◽  
A. Stonert ◽  
E. Guziewicz ◽  
S. Gierałtowska ◽  
T.A. Krajewski ◽  
...  

1996 ◽  
Vol 40 (4) ◽  
pp. 297-345 ◽  
Author(s):  
C. Leguijt ◽  
P. Lölgen ◽  
J.A. Eikelboom ◽  
A.W. Weeber ◽  
F.M. Schuurmans ◽  
...  

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