Study on the use of CuSnTi brazing alloy for induction brazing of diamond grits surface-treated by direct current plasma chemical vapor deposition

International Journal of Refractory Metals and Hard Materials ◽

10.1016/j.ijrmhm.2013.05.006 ◽

2013 ◽

Vol 41 ◽

pp. 339-344 ◽

Author(s):

Bojiang Ma ◽

Feng Lian

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Induction Brazing ◽

Direct Current Plasma

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The synthesis of graphene nanowalls on a diamond film on a silicon substrate by direct-current plasma chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.10.038 ◽

2013 ◽

Vol 53 ◽

pp. 120-129 ◽

Author(s):

Yonhua Tzeng ◽

Wai Leong Chen ◽

Chiahao Wu ◽

Jui-Yung Lo ◽

Chiuan-Yi Li

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Nanocrystalline Diamond Films Deposited by the Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method with Different Compositions of CH4/Ar/H2Gas Mixture

The Journal of Physical Chemistry C ◽

10.1021/jp710082n ◽

2008 ◽

Vol 112 (5) ◽

pp. 1401-1406 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Da Lei ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Field emission characteristics of nano-sized dot array carbon nano-tube emitters fabricated by direct current plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.09.005 ◽

2009 ◽

Vol 18 (2-3) ◽

pp. 548-552 ◽

Author(s):

T. Matsuda ◽

J. Sato ◽

T. Ishikawa ◽

A. Ogino ◽

M. Nagatsu

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma ◽

Carbon Nano Tube

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Direct Current Discharge Plasma Chemical Vapor Deposition of Nanocrystalline Graphite Films on Carbon Fibers

The Journal of Physical Chemistry C ◽

10.1021/jp801615w ◽

2008 ◽

Vol 112 (29) ◽

pp. 10735-10739 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Wentao Qi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Fibers ◽

Direct Current ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Discharge ◽

Nanocrystalline Graphite

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Intermittent growth of a diamond film by direct current hot cathode plasma chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.08.041 ◽

2013 ◽

Vol 51 ◽

pp. 437 ◽

Author(s):

Hong-wei Jiang ◽

Hai-liang Huang ◽

Xiang-hua Jia ◽

Long-cheng Yin ◽

Yu-qiang Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Cathode Plasma ◽

Plasma Chemical Vapor Deposition

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Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/678/1/012166 ◽

2019 ◽

Vol 678 ◽

pp. 012166

Author(s):

Chunlei Wu ◽

Yanfeng Liu ◽

Guodong Hao ◽

Ruihua Zhu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Growth Behavior ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Plasma environment during hot cathode direct current discharge plasma chemical vapor deposition of diamond films

Science in China Series A Mathematics ◽

10.1007/bf02879069 ◽

1999 ◽

Vol 42 (3) ◽

pp. 332-336

Author(s):

Zhu Xiaodong ◽

Zhan Rujuan ◽

Zhou Haiyang ◽

Hu Min ◽

Wen Xiaohui ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Discharge Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Current Discharge ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Discharge

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Synthesis and Characterization of Diamond Microcrystals and Nanorods Deposited by Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method

The Journal of Physical Chemistry C ◽

10.1021/jp7109912 ◽

2008 ◽

Vol 112 (15) ◽

pp. 6160-6164 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Da Lei ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Synthesis And Characterization ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Effect of CO 2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method

Chinese Physics Letters ◽

10.1088/0256-307x/27/8/088103 ◽

2010 ◽

Vol 27 (8) ◽

pp. 088103

Author(s):

Zhang Chun-Mei ◽

Zheng Yan-Bin ◽

Jiang Zhi-Gang ◽

Lv Xian-Yi ◽

Hou Xue ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Cathode Plasma ◽

Plasma Chemical Vapor Deposition

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Emission spectroscopy during direct‐current‐biased, microwave‐plasma chemical vapor deposition of diamond

Applied Physics Letters ◽

10.1063/1.110055 ◽

1993 ◽

Vol 63 (3) ◽

pp. 314-316 ◽

Author(s):

Yuzo Shigesato ◽

Rachel E. Boekenhauer ◽

Brian W. Sheldon

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Emission Spectroscopy ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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