Intermittent growth of a diamond film by direct current hot cathode plasma chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.08.041 ◽

2013 ◽

Vol 51 ◽

pp. 437 ◽

Author(s):

Hong-wei Jiang ◽

Hai-liang Huang ◽

Xiang-hua Jia ◽

Long-cheng Yin ◽

Yu-qiang Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Cathode Plasma ◽

Plasma Chemical Vapor Deposition

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The synthesis of graphene nanowalls on a diamond film on a silicon substrate by direct-current plasma chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.10.038 ◽

2013 ◽

Vol 53 ◽

pp. 120-129 ◽

Author(s):

Yonhua Tzeng ◽

Wai Leong Chen ◽

Chiahao Wu ◽

Jui-Yung Lo ◽

Chiuan-Yi Li

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Effect of CO 2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method

Chinese Physics Letters ◽

10.1088/0256-307x/27/8/088103 ◽

2010 ◽

Vol 27 (8) ◽

pp. 088103

Author(s):

Zhang Chun-Mei ◽

Zheng Yan-Bin ◽

Jiang Zhi-Gang ◽

Lv Xian-Yi ◽

Hou Xue ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Cathode Plasma ◽

Plasma Chemical Vapor Deposition

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Direct Current Discharge Plasma Chemical Vapor Deposition of Nanocrystalline Graphite Films on Carbon Fibers

The Journal of Physical Chemistry C ◽

10.1021/jp801615w ◽

2008 ◽

Vol 112 (29) ◽

pp. 10735-10739 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Wentao Qi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Fibers ◽

Direct Current ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Discharge ◽

Nanocrystalline Graphite

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The formation of a (111) texture of the diamond film on Pt/TiO2/SiO /Si substrate by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(02)00021-3 ◽

2002 ◽

Vol 11 (3-6) ◽

pp. 499-503 ◽

Author(s):

Yasuhiko Hayashi ◽

Yoshinori Matsushita ◽

Tetsuo Soga ◽

Masayoshi Umeno ◽

Takashi Jimbo

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Si Substrate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Growth, microstructure, and field-emission properties of synthesized diamond film on adamantane-coated silicon substrate by microwave plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.3427436 ◽

2010 ◽

Vol 107 (10) ◽

pp. 103305 ◽

Author(s):

Rajanish N. Tiwari ◽

Li Chang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Diamond Film ◽

Vapor Deposition ◽

Silicon Substrate ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties

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Nucleation Mechanism of Polycrystalline Diamond Film Deposited on Ceramic Alumina by Microwave Plasma Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/13/7/021 ◽

1996 ◽

Vol 13 (7) ◽

pp. 557-560 ◽

Author(s):

Yi-ben Xia ◽

Yao-wu Mo ◽

Yu Wang ◽

Xiao-qin Huang ◽

Da-ming Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Nucleation Mechanism ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Polycrystalline Diamond Film

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Fabrication of a micro-patterned diamond film by site-selective plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(98)01136-5 ◽

1998 ◽

Vol 334 (1-2) ◽

pp. 161-164 ◽

Author(s):

Yukihiro Sakamoto ◽

Matsufumi Takaya ◽

Hiroyuki Sugimura ◽

Osamu Takai ◽

Nobuyuki Nakagiri

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

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Plasma environment during hot cathode direct current discharge plasma chemical vapor deposition of diamond films

Science in China Series A Mathematics ◽

10.1007/bf02879069 ◽

1999 ◽

Vol 42 (3) ◽

pp. 332-336

Author(s):

Zhu Xiaodong ◽

Zhan Rujuan ◽

Zhou Haiyang ◽

Hu Min ◽

Wen Xiaohui ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Discharge Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Plasma Chemical ◽

Current Discharge ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Discharge

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Smooth diamond film deposition by a. c. discharge plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/0040-6090(91)90422-t ◽

1991 ◽

Vol 206 (1-2) ◽

pp. 204-207 ◽

Author(s):

S.Y. Choi ◽

C.J. Zhang ◽

G.S. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Film Deposition ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Field emission properties of the polycrystalline diamond film prepared by microwave-assisted plasma chemical vapor deposition

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.589888 ◽

1998 ◽

Vol 16 (2) ◽

pp. 712 ◽

Author(s):

Sang Jik Kwon

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties ◽

Microwave Assisted ◽

Polycrystalline Diamond Film

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