Nanocrystalline Diamond Films Deposited by the Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method with Different Compositions of CH4/Ar/H2Gas Mixture

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/678/1/012166 ◽

2019 ◽

Vol 678 ◽

pp. 012166

Author(s):

Chunlei Wu ◽

Yanfeng Liu ◽

Guodong Hao ◽

Ruihua Zhu

Keyword(s):

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Growth Behavior ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

Effect of CO 2 Addition on Preparation of Diamond Films by Direct-Current Hot-Cathode Plasma Chemical Vapor Deposition Method

Chinese Physics Letters ◽

10.1088/0256-307x/27/8/088103 ◽

2010 ◽

Vol 27 (8) ◽

pp. 088103

Author(s):

Zhang Chun-Mei ◽

Zheng Yan-Bin ◽

Jiang Zhi-Gang ◽

Lv Xian-Yi ◽

Hou Xue ◽

...

Keyword(s):

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Cathode Plasma ◽

Synthesis and Characterization of Diamond Microcrystals and Nanorods Deposited by Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method

The Journal of Physical Chemistry C ◽

10.1021/jp7109912 ◽

2008 ◽

Vol 112 (15) ◽

pp. 6160-6164 ◽

Cited By ~ 9

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Da Lei ◽

...

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Synthesis And Characterization ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

Self-standing device-quality single-crystalline diamond films on vicinal (001) surfaces fabricated using microwave-plasma chemical-vapor-deposition method

Thin Solid Films ◽

10.1016/j.tsf.2010.03.024 ◽

2010 ◽

Vol 518 (21) ◽

pp. S38-S41 ◽

Cited By ~ 6

Author(s):

Shota Iguchi ◽

Osamu Maida ◽

Toshimichi Ito

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Single Crystalline ◽

Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Journal of the Korean Physical Society ◽

10.3938/jkps.54.194 ◽

2009 ◽

Vol 54 (1) ◽

pp. 194-199 ◽

Cited By ~ 12

Author(s):

Minsung Jeon ◽

Shuhei Yoshiba ◽

Koichi Kamisako

Keyword(s):

Thin Film ◽

Solar Cell ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Cited By ~ 5

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Thin Films ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Cited By ~ 5

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Cited By ~ 11

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Novel plasma chemical vapor deposition method of carbon nanotubes at low temperature for field emission display application

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00475-1 ◽

2001 ◽

Vol 10 (2) ◽

pp. 248-253 ◽

Cited By ~ 19

Author(s):

Suk Jae Chung ◽

Sung Hoon Lim ◽

Choong Hun Lee ◽

Jin Jang

Keyword(s):

Carbon Nanotubes ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Field Emission Display ◽

Plasma Chemical ◽

Preparation of PbTiO3 films by sputter assisted plasma chemical vapor deposition method.

Shinku ◽

10.3131/jvsj.32.341 ◽

1989 ◽

Vol 32 (3) ◽

pp. 341-344

Author(s):

Shoichi MOCHIZUKI ◽

Saburo KIMURA ◽

Tadashi ISHIDA ◽

Ryoji MAKABE

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽