The synthesis of graphene nanowalls on a diamond film on a silicon substrate by direct-current plasma chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.10.038 ◽

2013 ◽

Vol 53 ◽

pp. 120-129 ◽

Author(s):

Yonhua Tzeng ◽

Wai Leong Chen ◽

Chiahao Wu ◽

Jui-Yung Lo ◽

Chiuan-Yi Li

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Silicon Substrate ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Intermittent growth of a diamond film by direct current hot cathode plasma chemical vapor deposition

Carbon ◽

10.1016/j.carbon.2012.08.041 ◽

2013 ◽

Vol 51 ◽

pp. 437 ◽

Author(s):

Hong-wei Jiang ◽

Hai-liang Huang ◽

Xiang-hua Jia ◽

Long-cheng Yin ◽

Yu-qiang Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Cathode Plasma ◽

Plasma Chemical Vapor Deposition

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Growth, microstructure, and field-emission properties of synthesized diamond film on adamantane-coated silicon substrate by microwave plasma chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.3427436 ◽

2010 ◽

Vol 107 (10) ◽

pp. 103305 ◽

Author(s):

Rajanish N. Tiwari ◽

Li Chang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Diamond Film ◽

Vapor Deposition ◽

Silicon Substrate ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Field Emission Properties

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Nanocrystalline Diamond Films Deposited by the Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method with Different Compositions of CH4/Ar/H2Gas Mixture

The Journal of Physical Chemistry C ◽

10.1021/jp710082n ◽

2008 ◽

Vol 112 (5) ◽

pp. 1401-1406 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Da Lei ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Study on the use of CuSnTi brazing alloy for induction brazing of diamond grits surface-treated by direct current plasma chemical vapor deposition

International Journal of Refractory Metals and Hard Materials ◽

10.1016/j.ijrmhm.2013.05.006 ◽

2013 ◽

Vol 41 ◽

pp. 339-344 ◽

Author(s):

Bojiang Ma ◽

Feng Lian

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Induction Brazing ◽

Direct Current Plasma

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Field emission characteristics of nano-sized dot array carbon nano-tube emitters fabricated by direct current plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2008.09.005 ◽

2009 ◽

Vol 18 (2-3) ◽

pp. 548-552 ◽

Author(s):

T. Matsuda ◽

J. Sato ◽

T. Ishikawa ◽

A. Ogino ◽

M. Nagatsu

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Direct Current ◽

Vapor Deposition ◽

Chemical Vapor ◽

Emission Characteristics ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma ◽

Carbon Nano Tube

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Direct Current Discharge Plasma Chemical Vapor Deposition of Nanocrystalline Graphite Films on Carbon Fibers

The Journal of Physical Chemistry C ◽

10.1021/jp801615w ◽

2008 ◽

Vol 112 (29) ◽

pp. 10735-10739 ◽

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Wentao Qi ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Carbon Fibers ◽

Direct Current ◽

Vapor Deposition ◽

Discharge Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Discharge ◽

Nanocrystalline Graphite

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The formation of a (111) texture of the diamond film on Pt/TiO2/SiO /Si substrate by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/s0925-9635(02)00021-3 ◽

2002 ◽

Vol 11 (3-6) ◽

pp. 499-503 ◽

Author(s):

Yasuhiko Hayashi ◽

Yoshinori Matsushita ◽

Tetsuo Soga ◽

Masayoshi Umeno ◽

Takashi Jimbo

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Si Substrate ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Nucleation Mechanism of Polycrystalline Diamond Film Deposited on Ceramic Alumina by Microwave Plasma Chemical Vapor Deposition

Chinese Physics Letters ◽

10.1088/0256-307x/13/7/021 ◽

1996 ◽

Vol 13 (7) ◽

pp. 557-560 ◽

Author(s):

Yi-ben Xia ◽

Yao-wu Mo ◽

Yu Wang ◽

Xiao-qin Huang ◽

Da-ming Chen ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Diamond Film ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Polycrystalline Diamond ◽

Nucleation Mechanism ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Polycrystalline Diamond Film

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Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/678/1/012166 ◽

2019 ◽

Vol 678 ◽

pp. 012166

Author(s):

Chunlei Wu ◽

Yanfeng Liu ◽

Guodong Hao ◽

Ruihua Zhu

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Growth Behavior ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

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Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column

Journal of Applied Physics ◽

10.1063/1.3533764 ◽

2011 ◽

Vol 109 (2) ◽

pp. 023303 ◽

Author(s):

Hak-Joo Lee ◽

Hyeongtag Jeon ◽

Wook-Seong Lee

Keyword(s):

Chemical Vapor Deposition ◽

Direct Current ◽

Diamond Film ◽

Vapor Deposition ◽

Positive Column ◽

Chemical Vapor ◽

Film Deposition ◽

Ultrananocrystalline Diamond ◽

Direct Current Plasma

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