Dependence of soft-magnetic properties on film thickness and high frequency characteristics for Fe–Co–Cr–N alloy films

2009 ◽  
Vol 476 (1-2) ◽  
pp. 599-602 ◽  
Author(s):  
W. Wang ◽  
Y. Chen ◽  
G.H. Yue ◽  
W.B. Mi ◽  
H.L. Bai ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Film Thickness ◽  
High Frequency ◽  
Frequency Characteristics ◽  
Soft Magnetic Properties ◽  
Soft Magnetic ◽  
Alloy Films

High frequency characteristics and soft magnetic properties of FeCoBN nanocrystalline films

2004 ◽  
Vol 201 (8) ◽  
pp. 1777-1780 ◽  
Author(s):  
Inyoung Kim ◽  
Jongryoul Kim ◽  
Ki Hyeon Kim ◽  
Masahiro Yamaguchi
Keyword(s):  
Magnetic Properties ◽  
High Frequency ◽  
Frequency Characteristics ◽  
Soft Magnetic Properties ◽  
Nanocrystalline Films ◽  
Soft Magnetic

Soft magnetic properties and high frequency characteristics of FeM (M = B, Hf, Zr) and pure Fe films fabricated by oblique deposition

2015 ◽  
Vol 120 (3) ◽  
pp. 1159-1163 ◽  
Author(s):  
Chengcheng Yang ◽  
Chao Zhang ◽  
Fenglong Wang ◽  
Zhong Zhao ◽  
Changjun Jiang ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
High Frequency ◽  
Frequency Characteristics ◽  
Soft Magnetic Properties ◽  
Soft Magnetic ◽  
Oblique Deposition

Study on the soft magnetic properties and high frequency characteristics of Co-M (M = Ti, Zr, and Hf) thin films

2012 ◽  
Vol 111 (7) ◽  
pp. 07A333 ◽  
Author(s):  
H. W. Chang ◽  
Y. H. Huang ◽  
C. C. Hsieh ◽  
C. W. Shih ◽  
W. C. Chang ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
High Frequency ◽  
Frequency Characteristics ◽  
Soft Magnetic Properties ◽  
Soft Magnetic

Optimized soft magnetic properties and high frequency characteristics of obliquely deposited Co–Zr thin films

2010 ◽  
Vol 43 (8) ◽  
pp. 085002 ◽  
Author(s):  
Zhengmei Zhang ◽  
Xiaolong Fan ◽  
Min Lin ◽  
Dangwei Guo ◽  
Guozhi Chai ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
High Frequency ◽  
Frequency Characteristics ◽  
Soft Magnetic Properties ◽  
Soft Magnetic

scholarly journals Влияние напряжения смещения и скорости осаждения на структуру и коэрцитивность пленок NiFe

2020 ◽  
Vol 62 (12) ◽  
pp. 2174
Author(s):  
А.С. Джумалиев ◽  
C.Л. Высоцкий ◽  
В.К. Сахаров
Keyword(s):  
Grain Size ◽  
Magnetic Properties ◽  
Film Thickness ◽  
Deposition Rate ◽  
Entire Range ◽  
Soft Magnetic Properties ◽  
Supercritical State ◽  
Dc Magnetron Sputtering ◽  
Soft Magnetic ◽  
Critical Film Thickness

Influence of the bias voltage Ub and the deposition rate  on the structure, grain size D, and coercivity Hc of NiFe films with the thickness d from 30 to 980 nm, grown onto Si / SiO2 substrates by DC magnetron sputtering, was studied. In the case Ub = 0, the decrease of  from ≈ nm/min to ≈ 7 nm/min is accompanied by the increase of the critical film thickness dcr from dcr ≈ 220 nm to dcr ≈ 270 nm. In this case, Hc in the films with d < dcr is characterized by the dependence Hc ~ D6 and varies from ~ 1 to ~ 20 Oe. In the case of Ub = -100 V, the effect of the deposition rate on the coercivity is much more noticeable. At ν = 7 and 14 nm / min, the films demonstrate soft magnetic properties (Нс ≈ 0.15 - 1.4 Oe) and the absence of dcr for the entire range of studied thicknesses. The films obtained at ν = 21 and 27 nm / min turn into the “supercritical” state at d ≥ dcr ≈ 520 nm, and, in the region d < dcr, they are characterized by the dependence Hc ~ D3 and by the increase of coercivity from ~ 0.35 to ~ 10 Oe.

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