Influence of Fe-doped on structural, electronic structural and optical properties of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapor deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2009.08.005 ◽

2009 ◽

Vol 487 (1-2) ◽

pp. 522-526 ◽

Author(s):

Hongliang Zhang ◽

Weidong Wu ◽

Wei Wang ◽

Chengshi Gong ◽

Zhibing He ◽

...

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Structural And Optical Properties ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Structure and optical properties of conglobate hydrogenated amorphous carbon films prepared by pulsed laser-induced chemical vapor deposition

Journal of Alloys and Compounds ◽

10.1016/j.jallcom.2016.01.134 ◽

2016 ◽

Vol 667 ◽

pp. 96-100 ◽

Author(s):

Z.W. Xiong ◽

L.H. Cao

Keyword(s):

Optical Properties ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Pulsed Laser ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

Thin Solid Films ◽

10.1016/s0040-6090(01)01193-2 ◽

2001 ◽

Vol 394 (1-2) ◽

pp. 114-123 ◽

Author(s):

M Lindstam

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Temperature Deposition ◽

Hydrogenated Amorphous

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Electrochemical properties of N-doped hydrogenated amorphous carbon films fabricated by plasma-enhanced chemical vapor deposition methods

Electrochimica Acta ◽

10.1016/j.electacta.2010.11.006 ◽

2011 ◽

Vol 56 (3) ◽

pp. 1172-1181 ◽

Author(s):

Yoriko Tanaka ◽

Masahiro Furuta ◽

Koichi Kuriyama ◽

Ryosuke Kuwabara ◽

Yukiko Katsuki ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Electrochemical Properties ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Fracture toughness, hardness and elastic modulus of hydrogenated amorphous carbon films deposited by chemical vapor deposition

Thin Solid Films ◽

10.1016/j.tsf.2005.08.342 ◽

2006 ◽

Vol 496 (2) ◽

pp. 481-488 ◽

Author(s):

M.D. Michel ◽

L.V. Muhlen ◽

C.A. Achete ◽

C.M. Lepienski

Keyword(s):

Fracture Toughness ◽

Chemical Vapor Deposition ◽

Elastic Modulus ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Influence of temperature on the hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.3497025 ◽

2010 ◽

Vol 28 (6) ◽

pp. 1363-1365 ◽

Author(s):

Jiung Wu ◽

Yi-Lung Cheng ◽

Ming-Kai Shiau

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Influence Of Temperature ◽

Hydrogenated Amorphous Carbon ◽

Influence Of Temperature On ◽

Hydrogenated Amorphous

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On the microstructural, optical, and thermal properties of hydrogenated amorphous carbon films prepared by plasma enhanced chemical vapor deposition

Journal of Applied Physics ◽

10.1063/1.354358 ◽

1993 ◽

Vol 74 (7) ◽

pp. 4673-4680 ◽

Author(s):

L. H. Chou ◽

H. W. Wang

Keyword(s):

Thermal Properties ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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The effect of ion energy on the formation of the silicon carbide interface of hydrogenated amorphous carbon films grown on silicon by plasma assisted chemical vapor deposition

Surface Science ◽

10.1016/0039-6028(92)90021-w ◽

1992 ◽

Vol 260 (1-3) ◽

pp. 85-96 ◽

Author(s):

M. Kawasaki ◽

G.J. Vandentop ◽

G.A. Somorjai

Keyword(s):

Silicon Carbide ◽

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Plasma treatment effects on hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition

Journal of Physics and Chemistry of Solids ◽

10.1016/j.jpcs.2007.07.126 ◽

2008 ◽

Vol 69 (2-3) ◽

pp. 505-508 ◽

Author(s):

Jun Wu ◽

Ying-Lang Wang ◽

Cheng-Tzu Kuo

Keyword(s):

Chemical Vapor Deposition ◽

Plasma Treatment ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Treatment Effects ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Hydrogenated amorphous carbon films prepared by plasma‐enhanced chemical‐vapor deposition

Journal of Applied Physics ◽

10.1063/1.351631 ◽

1992 ◽

Vol 72 (5) ◽

pp. 2027-2035 ◽

Author(s):

L. H. Chou

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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Hydrogenated Amorphous Carbon Films Prepared by Plasma-enhanced Chemical Vapor Deposition

2008 International Conference on Advanced Semiconductor Devices and Microsystems ◽

10.1109/asdam.2008.4743297 ◽

2008 ◽

Author(s):

J. Huran ◽

A.P. Kobzev ◽

N.I. Balalykin ◽

J. Pezoltd

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Hydrogenated Amorphous

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