Transparent conductive ZnO thin films on glass substrates deposited by pulsed laser deposition

We have found that by varying only the substrate temperature and oxygen pressure five different crystallographic orientations of V2O5 thin films can be grown, ranging from amorphous to highly textured crystalline. Dense, phase-pure V2O5 thin films were grown on SnO2/glass substrates and amorphous quartz substrates by pulsed laser deposition over a wide range of temperatures and oxygen pressures. The films' microstructure, crystallinity, and texturing were characterized by electron microscopy, x-ray diffraction, and Raman spectroscopy. Temperature and oxygen pressure appeared to play more significant roles in the resulting crystallographic texture than did the choice of substrate. A growth map summarizes the results and delineates the temperature and O2 pressure window for growing dense, uniform, phase-pure V2O5 films.

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Epitaxial growth of Al-doped ZnO thin films grown by pulsed laser deposition

Thin Solid Films ◽

10.1016/s0040-6090(02)00658-2 ◽

2002 ◽

Vol 420-421 ◽

pp. 107-111 ◽

Cited By ~ 159

Author(s):

H Kim ◽

J.S Horwitz ◽

S.B Qadri ◽

D.B Chrisey

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Epitaxial Growth ◽

Pulsed Laser ◽

Laser Deposition ◽

Zno Thin Films ◽

Doped Zno

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ZnO thin films on Si(1 1 1) grown by pulsed laser deposition from metallic Zn target

Applied Surface Science ◽

10.1016/j.apsusc.2006.01.018 ◽

2006 ◽

Vol 253 (2) ◽

pp. 841-845 ◽

Cited By ~ 20

Author(s):

Jie Zhao ◽

Lizhong Hu ◽

Zhaoyang Wang ◽

Jie Sun ◽

Zhijun Wang

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Pulsed Laser ◽

Laser Deposition ◽

Zno Thin Films

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Study of structural, optical and electrical properties of thin Ag2Cu2O4 films prepared by pulsed laser deposition

Iraqi Journal of Physics (IJP) ◽

10.30723/ijp.v15i34.119 ◽

2019 ◽

Vol 15 (34) ◽

pp. 41-54

Author(s):

Iqbal S. Naji

Keyword(s):

Thin Films ◽

Pulsed Laser Deposition ◽

Sintering Temperature ◽

Pulsed Laser ◽

Laser Deposition ◽

Positive Sign ◽

Glass Substrates ◽

Atomic Force ◽

Structural Surface ◽

P Type

The influence of sintering and annealing temperatures on the structural, surface morphology, and optical properties of Ag2Cu2O4 thin films which deposited on glass substrates by pulsed laser deposition method have been studied. Ag2Cu2O4 powders have polycrystalline structure, and the Ag2Cu2O4 phase was appear as low intensity peak at 35.57o which correspond the reflection from (110) plane. Scan electron microscopy images of Ag2Cu2O4 powder has been showed agglomerate of oxide particles with platelets shape. The structure of thin films has been improved with annealing temperature. Atomic Force micrographs of Ag2Cu2O4 films showed uniform, homogenous films and the shape of grains was almost spherical and larger grain size of 97.85 nm has obtained for film sintered at 600 °C. The optical band gap was increase from 1.6 eV to 1.65 eV when sintering temperature increased to 300 °C and decrease to 1.45 eV at 600 °C for the films deposited at room temperature. Heat treatment of films has been increased the energy band with increasing sintering temperature. Hall coefficient of Ag2Cu2O4 films have a positive sign which means the charge carrier is a p-type. The electrical conductivity decreases with increasing of the sintering temperature for as deposited and annealed films.

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