Scratch resistance of cobalt boride layer subjected to a diffusion annealing process
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2020 ◽
Vol 29
(1)
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pp. 109-125
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2019 ◽
Vol 45
(6)
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pp. 7767-7777
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2013 ◽
Vol 237
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pp. 429-439
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2018 ◽
Vol 119
(10)
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pp. 927-935
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2017 ◽
Vol 309
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pp. 155-163
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Achievement of low p-type carrier concentration for MOCVD growth HgCdTe without an annealing process
1998 ◽
Vol 184-185
(1-2)
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pp. 1228-1231