Fabrication and characterization of M-I-FIS ferroelectric-gate structures using HfAlOx buffer layer

2007 ◽  
Vol 84 (9-10) ◽  
pp. 2018-2021 ◽  
Author(s):  
E. Tokumitsu ◽  
Y. Takano ◽  
H. Shibata ◽  
H. Saiki
2017 ◽  
Vol 56 (10S) ◽  
pp. 10PF09 ◽  
Author(s):  
Naoya Oshima ◽  
Kiyoshi Uchiyama ◽  
Yoshitaka Ehara ◽  
Takahiro Oikawa ◽  
Daichi Ichinose ◽  
...  

2003 ◽  
Vol 392-396 ◽  
pp. 1346-1352 ◽  
Author(s):  
M. Shirakawa ◽  
J. Unno ◽  
K. Aizawa ◽  
M. Kusunoki ◽  
M. Mukaida ◽  
...  

2015 ◽  
Vol 54 (10S) ◽  
pp. 10NA15 ◽  
Author(s):  
Naoya Oshima ◽  
Kiyoshi Uchiyama ◽  
Yoshitaka Ehara ◽  
Takahiro Oikawa ◽  
Hiroki Tanaka ◽  
...  

2021 ◽  
Author(s):  
Keyvan Ahmadi ◽  
Mohamad Hossein Poorghadiri Isfahani ◽  
Mohamad Hossein Fathi

Abstract In this work the design, fabrication and characterization of a TE-pass plasmonic waveguide polarizer on Ti in-diffused channel waveguide fabricated on x-cut LiNbO3 substrate are reported. By deposition of MgF2 of 5nm thickness as the buffer layer and Au layer of about 30nm thickness as the cladding layer the polarization extinction ratio measured to be 32dB and insertion loss for TE mode was about 2dB in a single mode channel waveguide of 2.1cm length.


2019 ◽  
Vol 35 (4) ◽  
pp. 475-484
Author(s):  
SHIVA ARUN ◽  
◽  
PRABHA BHARTIYA ◽  
AMREEN NAZ ◽  
SUDHEER RAI ◽  
...  

2019 ◽  
Vol 139 (11) ◽  
pp. 375-380
Author(s):  
Harutoshi Takahashi ◽  
Yuta Namba ◽  
Takashi Abe ◽  
Masayuki Sohgawa

2015 ◽  
Vol 135 (11) ◽  
pp. 474-475
Author(s):  
Koji Sugano ◽  
Ryoji Hiraoka ◽  
Toshiyuki Tsuchiya ◽  
Osamu Tabata

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