Simulation, Fabrication and Characterization of an Integrated Plasmonic Polarizer on Ti Diffused LiNbO3 Channel Waveguide

In this work the design, fabrication and characterization of a TE-pass plasmonic waveguide polarizer on Ti in-diffused channel waveguide fabricated on x-cut LiNbO3 substrate are reported. By deposition of MgF2 of 5nm thickness as the buffer layer and Au layer of about 30nm thickness as the cladding layer the polarization extinction ratio measured to be 32dB and insertion loss for TE mode was about 2dB in a single mode channel waveguide of 2.1cm length.