Nanoimprint lithography has a great development in decades. Compressional gas cushion press is a novel method in improving the uniformity in nanoimprint lithography process. Based on compressional gas cushion press nanoimprint lithography system, an attenuation ring is added between the chamber wall and the pedestal. The attenuation ring decreases the influence of system vibration on the fidelity of patterning. The physical parameters of the attenuation material are optimized based on the theoretical models of the vibration attenuation and mechanical calculation. According to the optimization physical parameters, Young's modulus of a perfect material of attenuation ring should be smaller than 8 MPa, and Poisson's ratio should be close to 0.5. Therefore, natural rubber is employed as the material of attenuation ring. The simulation results based on COMSOL indicate that nested rectangular structure has the best attenuation effect among the four simulated internal structures. It provides technological supporting for the establishment of attenuation ring in compressional gas cushion press nanoimprint lithography system.
Manufacturing Nanoimprint Lithography System to Produce Efficient Microneedles Patch for Transdermal Drug Delivery
