Development of hydrogen-selective dimethoxydimethylsilane-derived silica membranes with thin active separation layer by chemical vapor deposition

2019 ◽  
Vol 580 ◽  
pp. 268-274 ◽  
Author(s):  
Kazuki Akamatsu ◽  
Masato Suzuki ◽  
Aiko Nakao ◽  
Shin-ichi Nakao
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Membranes

scholarly journals Synthesis of Silica Membranes by Chemical Vapor Deposition Using a Dimethyldimethoxysilane Precursor

Membranes ◽  
2020 ◽  
Vol 10 (3) ◽  
pp. 50 ◽  
Author(s):  
S. Ted Oyama ◽  
Haruki Aono ◽  
Atsushi Takagaki ◽  
Takashi Sugawara ◽  
Ryuji Kikuchi
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Composite Membranes ◽  
Hydrothermal Conditions ◽  
Porous Support ◽  
Silica Membranes ◽  
Silica Alumina ◽  
Alumina Composite ◽  
The Stability

Silica-based membranes prepared by chemical vapor deposition of tetraethylorthosilicate (TEOS) on γ-alumina overlayers are known to be effective for hydrogen separation and are attractive for membrane reactor applications for hydrogen-producing reactions. In this study, the synthesis of the membranes was improved by simplifying the deposition of the intermediate γ-alumina layers and by using the precursor, dimethyldimethoxysilane (DMDMOS). In the placement of the γ-alumina layers, earlier work in our laboratory employed four to five dipping-calcining cycles of boehmite sol precursors to produce high H2 selectivities, but this took considerable time. In the present study, only two cycles were needed, even for a macro-porous support, through the use of finer boehmite precursor particle sizes. Using the simplified fabrication process, silica-alumina composite membranes with H2 permeance > 10−7 mol m−2 s−1 Pa−1 and H2/N2 selectivity >100 were successfully synthesized. In addition, the use of the silica precursor, DMDMOS, further improved the H2 permeance without compromising the H2/N2 selectivity. Pure DMDMOS membranes proved to be unstable against hydrothermal conditions, but the addition of aluminum tri-sec-butoxide (ATSB) improved the stability just like for conventional TEOS membranes.

scholarly journals Atmospheric-pressure plasma-enhanced chemical vapor deposition of microporous silica membranes for gas separation

2017 ◽  
Vol 524 ◽  
pp. 644-651 ◽  
Author(s):  
Hiroki Nagasawa ◽  
Yuta Yamamoto ◽  
Nobukazu Tsuda ◽  
Masakoto Kanezashi ◽  
Tomohisa Yoshioka ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Separation ◽  
Vapor Deposition ◽  
Atmospheric Pressure ◽  
Atmospheric Pressure Plasma ◽  
Chemical Vapor ◽  
Microporous Silica ◽  
Silica Membranes ◽  
Pressure Plasma

Development of pore size-controlled silica membranes for gas separation by chemical vapor deposition

2008 ◽  
Vol 315 (1-2) ◽  
pp. 93-99 ◽  
Author(s):  
Yudai Ohta ◽  
Kazuki Akamatsu ◽  
Takashi Sugawara ◽  
Aiko Nakao ◽  
Akira Miyoshi ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Pore Size ◽  
Gas Separation ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Silica Membranes ◽  
Size Controlled
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