Magnetic properties of Co/Al2O3/Co junctions deposited by ultra high vacuum ion beam sputtering

2004 ◽  
Vol 109 (1-3) ◽  
pp. 213-216 ◽  
Author(s):  
C Maunoury ◽  
N Marsot ◽  
T Devolder ◽  
C Schwebel
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Characterizations of Co/Al2O3/Co/NiFe multilayers elaborated by ultra-high vacuum ion beam sputtering

2005 ◽  
Vol 25 (5-8) ◽  
pp. 752-755 ◽  
Author(s):  
E.H. Oubensaid ◽  
C. Maunoury ◽  
T. Devolder ◽  
N. Marsot ◽  
C. Schwebel
Keyword(s):  
Ion Beam ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

Deposition of Conductive Titanium Sub-Oxide Films by Reactive Ion-Beam Sputtering

1994 ◽  
Vol 337 ◽  
Author(s):  
K.G. Grigorov ◽  
A.H. Benhocine ◽  
D. Bouchier ◽  
F. Meyer
Keyword(s):  
Ion Beam ◽  
High Vacuum ◽  
Lattice Parameter ◽  
Ultra High Vacuum ◽  
Titanium Monoxide ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Cubic Structure ◽  
Electron Spectrometry

ABSTRACTTitanium monoxide films were deposited on silicon by reactive ion beam sputtering from a Ti target. The film composition was measured in situ by Auger electron spectrometry. It was observed that oxygen content in the deposit does not depend on the substrate temperature, up to 600 °C. Synthesized TiO films had a cubic structure with a lattice parameter of 4.17 Å, which confirmed that the O/Ti concentration ratio in the films was very close to the expected value. The films were found to be conductive, with a resistivity value equal to 170 μΩ cm. They had a yellowish metallic appearence and a very smooth surface. Sequences of annealings at increasing temperatures were performed under ultra-high-vacuum. No AES signal from silicon was observed up to a temperature of 700 °C.

scholarly journals Formation of High Purity Films by Negative Ion Beam Sputtering Using an Ultra-high Vacuum Self-Sputtering Method

2000 ◽  
Vol 41 (1) ◽  
pp. 31-33
Author(s):  
Akiyoshi Chayahara ◽  
Atsushi Kinomura ◽  
Nobuteru Tsubouchi ◽  
Claire Heck ◽  
Yuji Horino
Keyword(s):  
High Purity ◽  
Ion Beam ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Negative Ion ◽  
Ion Beam Sputtering ◽  
Beam Sputtering

UHV microscopy of surfaces: Recent results

1989 ◽  
Vol 47 ◽  
pp. 550-551
Author(s):  
J.E. Bonevich ◽  
J.P. Zhang ◽  
M. Jacoby ◽  
R. Ai ◽  
D. Dunn ◽  
...  
Keyword(s):  
Surface Science ◽  
Gold Film ◽  
Ion Beam ◽  
High Vacuum ◽  
Auger Spectroscopy ◽  
Ultra High Vacuum ◽  
Ion Beam Sputtering ◽  
Optical Heating ◽  
Beam Sputtering ◽  
Better Than

In order to examine surfaces of materials, a prerequisite is a microscope which combines ultra-high vacuum (UHV) with surface science cleaning and characterization techniques such as ion beam sputtering, annealing, and Auger spectroscopy. In order to achieve this, we have mounted onto the side of a UHV-H9000 microscope LEED/Auger, an ion gun, and optical heating; in the transfer chamber specimens can be cleaned at a base pressure of 2×10-10 torr and transferred into the microscope which operates at pressures better than 2×10-10 torr. With this marriage, it is relatively simple to prepare and characterize clean surfaces.As an example, thin gold film specimens, textured with the [111] normal to the film, were made in a standard vacuum evaporator and floated onto a gold grid. The transfer chamber was then baked-out at 250°C for about 12 hours to achieve UHV conditions. Figure 1 shows an image taken from the gold film after bakeout.

Microstructures of Si(111) on Ion Sputtering and Electron Annealing

1991 ◽  
Vol 236 ◽  
Author(s):  
R. Al ◽  
T. S. Savage ◽  
P. Xu ◽  
J. P. Zhang ◽  
L. D. Marks
Keyword(s):  
Sample Preparation ◽  
Surface Science ◽  
Microstructure Evolution ◽  
Preparation Method ◽  
Ion Beam ◽  
High Vacuum ◽  
Ultra High Vacuum ◽  
Ion Beam Sputtering ◽  
Transmission Electron ◽  
Beam Sputtering

AbstractThe microstructure evolution during preparation of thin Si(111) samples for surface sensitive imaging has been studied using ultra-high vacuum (UHV) transmission electron microscopy (TEM). The effects of ion beam sputtering and electron annealing have been investigated. A unique and routine sample preparation method for surface sensitive TEM imaging that combines TEM sample preparations with surface science sample preparation was developed. The microstructure evolution during the sample preparation process was studied in detail.

Structural and magnetic properties of Fe-Co thin films elaborated by ion-beam sputtering

1994 ◽  
Vol 133 (1-3) ◽  
pp. 493-496 ◽  
Author(s):  
P. Pain ◽  
J.P. Eymery ◽  
M. Cahoreau ◽  
M.F. Denanot ◽  
J.F. Dinhut
Keyword(s):  
Thin Films ◽  
Magnetic Properties ◽  
Ion Beam ◽  
Ion Beam Sputtering ◽  
Beam Sputtering ◽  
Structural And Magnetic Properties

Synthesis and magnetic properties of iron nitride films deposited on Ge(100) by reactive ion beam sputtering

1997 ◽  
Vol 82 (10) ◽  
pp. 5154-5158 ◽  
Author(s):  
Xing-zhao Ding ◽  
Fu-min Zhang ◽  
Jian-sheng Yan ◽  
Hong-lie Shen ◽  
Xi Wang ◽  
...  
Keyword(s):  
Magnetic Properties ◽  
Ion Beam ◽  
Iron Nitride ◽  
Ion Beam Sputtering ◽  
Beam Sputtering
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