Synthesis of Nickel Sulfide Dendrites from Nickel Foil Using Thermal Annealing

The nickel sulfide (Ni3S2) thin film could be prepared from Ni/S double layer, which was deposited on nickel foil using evaporation and sputtering. The nickel sulfide electrode was discharged and charged between 0.6V and 2.6V versus Li/Li+ at room temperature. The nickel sulfide film had the first discharge capacity of 270mAh/g, and two plateaus at 1.3V and 1.8V.

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Effect of thermal annealing on the properties of nickel sulfide nanostructures: Structural phase transition

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2017.03.021 ◽

2017 ◽

Vol 64 ◽

pp. 130-136 ◽

Cited By ~ 4

Author(s):

Ofeliya O. Balayeva ◽

Abdulsaid A. Azizov ◽

Mustafa B. Muradov ◽

Abel M. Maharramov ◽

Goncha M. Eyvazova ◽

...

Keyword(s):

Phase Transition ◽

Thermal Annealing ◽

Structural Phase Transition ◽

Nickel Sulfide ◽

Structural Phase

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Annealing Of Radiation Damage in Tungsten

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100069053 ◽

1970 ◽

Vol 28 ◽

pp. 412-413

Author(s):

Robert C. Rau ◽

John Moteff

Keyword(s):

Electron Microscopy ◽

Transmission Electron Microscopy ◽

Radiation Damage ◽

Thermal Annealing ◽

Neutron Fluence ◽

Dislocation Loops ◽

Defect Clusters ◽

Polycrystalline Tungsten ◽

Transmission Electron ◽

Radiation Induced

Transmission electron microscopy has been used to study the thermal annealing of radiation induced defect clusters in polycrystalline tungsten. Specimens were taken from cylindrical tensile bars which had been irradiated to a fast (E > 1 MeV) neutron fluence of 4.2 × 1019 n/cm2 at 70°C, annealed for one hour at various temperatures in argon, and tensile tested at 240°C in helium. Foils from both the unstressed button heads and the reduced areas near the fracture were examined.Figure 1 shows typical microstructures in button head foils. In the unannealed condition, Fig. 1(a), a dispersion of fine dot clusters was present. Annealing at 435°C, Fig. 1(b), produced an apparent slight decrease in cluster concentration, but annealing at 740°C, Fig. 1(C), resulted in a noticeable densification of the clusters. Finally, annealing at 900°C and 1040°C, Figs. 1(d) and (e), caused a definite decrease in cluster concentration and led to the formation of resolvable dislocation loops.

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Microstructural and Microchemical Characterization of Nickel Sulfide Inclusions in Plate Glass

Proceedings, annual meeting, Electron Microscopy Society of America ◽

10.1017/s0424820100089123 ◽

1991 ◽

Vol 49 ◽

pp. 962-963

Author(s):

J. Cooper ◽

O. Popoola ◽

W. M. Kriven

Keyword(s):

Thermal Expansion ◽

Phase Transformation ◽

Glass Matrix ◽

Nickel Sulfide ◽

Plate Glass ◽

Thermal Expansion Mismatch ◽

Volume Increase ◽

Β Phase ◽

Microchemical Characterization

Nickel sulfide inclusions have been implicated in the spontaneous fracture of large windows of tempered plate glass. Two alternative explanations for the fracture-initiating behaviour of these inclusions have been proposed: (1) the volume increase which accompanies the α to β phase transformation in stoichiometric NiS, and (2) the thermal expansion mismatch between the nickel sulfide phases and the glass matrix. The microstructure and microchemistry of the small inclusions (80 to 250 μm spheres), needed to determine the cause of fracture, have not been well characterized hitherto. The aim of this communication is to report a detailed TEM and EDS study of the inclusions.

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