An estimation for complex index of refraction based on active polarized reflection measurement

2021 ◽  
pp. 127170
Author(s):  
Kai Wang ◽  
Hong Liu ◽  
Weijun Zhong ◽  
Xiuxing Zhang ◽  
Fengqi Guo
1987 ◽  
Vol 2 (5) ◽  
pp. 645-647 ◽  
Author(s):  
Shuhan Lin ◽  
Shuguang Chen

Optical properties of plasma-deposited amorphous hydrogenated carbon films were studied by spectroscopic ellipsometry. From the ellipsometry data, the real and imaginary parts, n and k, of the complex index of refraction of the film have been deduced for photon energies between 2.0 and 4.0 eV for as-grown as well as for thermally annealed films. Here n and k showed considerable variation with subsequent annealing, even under 400°C. A tentative explanation of the results is proposed.


1987 ◽  
Vol 26 (20) ◽  
pp. 4447 ◽  
Author(s):  
Gaetan Duplain ◽  
Russell Boulay ◽  
P. A. Bélanger

Sign in / Sign up

Export Citation Format

Share Document