scholarly journals Influence of substrate temperature and deposition rate on structural and mechanical properties of shape memory NiTi films

2010 ◽  
Vol 10 ◽  
pp. 44-51 ◽  
Author(s):  
Sudhir Kumar Sharma ◽  
H.S. Vijaya ◽  
S. Mohan
Keyword(s):  
Mechanical Properties ◽  
Substrate Temperature ◽  
Shape Memory ◽  
Deposition Rate ◽  
Influence Of Substrate

Influence of Substrate Temperature and Bias Voltage on Structure and Mechanical Properties of CrN Coatings

2013 ◽  
Vol 591 ◽  
pp. 99-103 ◽  
Author(s):  
Hao Zhang ◽  
Shu Wang Duo ◽  
Xiang Min Xu ◽  
Huan Ke ◽  
Ting Zhi Liu ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Substrate Temperature ◽  
Deposition Rate ◽  
Bias Voltage ◽  
High Deposition Rate ◽  
Properties Of Coatings ◽  
Unbalanced Magnetron ◽  
Magnetron Sputter ◽  
Influence Of Substrate ◽  
Crn Coatings

CrN coatings have been deposited successfully by Closed Filed Unbalanced Magnetron Sputter Ion Plating (CFUMSIP). The effect of substrate temperature (TS) and bias voltage (VB) together on microstructure, morphologies and mechanical properties of CrN coatings were studied. The results showed that the deposition rate of CrN coatings declines with the increase of VB Under both room temperature (R.M.) and 300°C. The FCC-CrN disappeared gradually and orth-CrN arised with the increase of VB, and the TS promoted the transformation from FCC - CrN to orth - CrN. The surface morphology of CrN coatings with changed VBs was greatly different, and VB could further improve the mechanical properties of coatings. In this paper, the CrN coating with the parameters (TS =300°C, VB =-30V) had relatively high deposition rate and mechanical properties.

scholarly journals Modifying the nanostructure and the mechanical properties of Mo2BC hard coatings: Influence of substrate temperature during magnetron sputtering

2018 ◽  
Vol 142 ◽  
pp. 203-211 ◽  
Author(s):  
Stephan Gleich ◽  
Rafael Soler ◽  
Hanna Fager ◽  
Hamid Bolvardi ◽  
Jan-Ole Achenbach ◽  
...  
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Substrate Temperature ◽  
Hard Coatings ◽  
Influence Of Substrate

Fabrication of TiNi shape memory alloy thin films by pulsed-laser deposition

2002 ◽  
Vol 17 (2) ◽  
pp. 279-283 ◽  
Author(s):  
X. Y. Chen ◽  
Y. F. Lu ◽  
Z. M. Ren ◽  
S. Zhu
Keyword(s):  
Thin Films ◽  
Shape Memory Alloy ◽  
Substrate Temperature ◽  
Shape Memory ◽  
Pulsed Laser Deposition ◽  
Deposition Rate ◽  
Crystallization Temperature ◽  
Pulsed Laser ◽  
Laser Deposition ◽  
Composition Control

Thin films of TiNi shape memory alloy have been prepared by pulsed-laser deposition at different substrate temperatures. The stoichiometry and crystallinity of the deposited films as functions of the substrate temperature were investigated. The deposition rate, surface morphology, crystallization temperature, and phase transformation behavior of the films were studied. It was found that both the substrate temperature and the laser fluence play important roles in the composition control and crystallization of the films. The deposition rate is of the order of 10−2 nm/pulse. The Ni content ranges from 46.7 to 52.0 at.%. The crystallization temperature of the amorphous Ti–51.5 at.% Ni films is around 460 °C. The activation energy of the crystallization process was determined by Kissinger's method to be 301 kJ/mol. The martensitic transformation temperature of the annealed Ti–51.5 at.% Ni film was determined to be −20.8 °C.

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