Maskless electrochemical micromachining (EMM) is an alternative method to fabricate microsurface textures on conductive substances, but it is still very challenging issue to create microsurface textures by this method. This paper proposes a new issue that maskless EMM process generates micro rectangular patterns using various pulse waveforms i.e. triangular, sine and square of pulsed DC power supply at constant voltage mode on stainless steel (SS-304) workpiece. A novel concept of maskless EMM setup consisting of EMM cell, electrode holding devices, electrical connections and vertical cross flow electrolyte system is introduced for the generation of high-quality micro rectangular patterns using various pulse waveforms. Another important finding is that SU-8 2150 negative photoresist can fabricate more than 28 micro rectangular patterned samples with higher dimensional accuracy and surface quality. The influence of machining voltage, inter electrode gap, pulse frequency, duty ratio and flow rate is investigated on machining performance such as length overcut, width overcut, machining depth and surface roughness ([Formula: see text] of micro rectangular pattern using three pulse waveforms. One mathematical model is developed to show the effectiveness of three pulse waveforms by the estimation of current efficiencies. From the experimental investigation, it is observed that higher frequency with square waveform at constant duty ratio is suitable to generate high-quality micro rectangular patterns under pulsed DC power supply.
Designing the Topology of a Unipolar Pulsed-DC Power Supply using the Open-source Scilab/Xcos Software for a Low-cost Plasma Etcher
