AbstractWe present a stochastic model which simulates electromigration damage in metallic interconnects by biased percolation of a random resistor network. The main features of experiments including Black's law and the log-normal distribution of the times to failure are well reproduced together with compositional effects showing up in early stage measurements made on Al-0.5%Cu and Al-1%Si lines.
Nitrogen-Doped Lithium Lanthanum Titanate Nanofiber-Polymer Composite Electrolytes for All-Solid-State Lithium Batteries
