The effect of r.f. substrate bias on the properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2004.08.134 ◽

2005 ◽

Vol 193 (1-3) ◽

pp. 152-156 ◽

Author(s):

H.Y. Lee ◽

D.K. Lee ◽

D.H. Kang ◽

J.J. Lee ◽

J.H. Joo

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Chemical Vapor ◽

Substrate Bias ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Optical, electrical and mechanical properties of nitrogen-rich carbon nitride films deposited by inductively coupled plasma chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(00)01316-x ◽

2000 ◽

Vol 377-378 ◽

pp. 156-162 ◽

Author(s):

C Popov ◽

L.M Zambov ◽

M.F Plass ◽

W Kulisch

Keyword(s):

Mechanical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Effect of Pulsed Substrate Bias on Film Properties of SiO2Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.03ca03 ◽

2010 ◽

Vol 49 (3) ◽

pp. 03CA03 ◽

Author(s):

Takahiro Hiramatsu ◽

Tokiyoshi Matsuda ◽

Hiroshi Furuta ◽

Hiroshi Nitta ◽

Toshiyuki Kawaharamura ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Substrate Bias ◽

Plasma Chemical ◽

Film Properties ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Properties of carbon nitride films produced by an inductively coupled plasma chemical vapor deposition

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2004.08.197 ◽

2004 ◽

Vol 188-189 ◽

pp. 440-445 ◽

Author(s):

D.K. Lee ◽

D.H. Kang ◽

H.Y. Lee ◽

J.J. Lee

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Carbon Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High voltage AlGaN/GaN Schottky barrier diode employing the inductively coupled plasma-chemical vapor deposition SiO2 passivation

2007 7th Internatonal Conference on Power Electronics ◽

10.1109/icpe.2007.4692351 ◽

2007 ◽

Author(s):

Young-Hwan Choi ◽

Jiyong Lim ◽

Kyu-Heon Cho ◽

Min-Koo Han

Keyword(s):

Chemical Vapor Deposition ◽

Schottky Barrier ◽

High Voltage ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Schottky Barrier Diode ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Electron Field Emission from a-C:F:N Film Deposited by Inductively Coupled Plasma Chemical Vapor Deposition

SID Symposium Digest of Technical Papers ◽

10.1889/1.1833829 ◽

1998 ◽

Vol 29 (1) ◽

pp. 601

Author(s):

Suk Jae Chung ◽

Eun Jung Han ◽

Jong Hyun Moon ◽

Myung Hwan Oh ◽

Jin Jang

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Electron Field Emission ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled ◽

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Organo-Functionalization of Silicon Nanocrystals Synthesized by Inductively Coupled Plasma Chemical Vapor Deposition

Bulletin of the Korean Chemical Society ◽

10.1002/bkcs.10758 ◽

2016 ◽

Vol 37 (5) ◽

pp. 705-712

Author(s):

Don-Sung Lee ◽

Dong-Hoe Choe ◽

Seung-Wan Yoo ◽

Jung-Hyung Kim ◽

Hyun-Dam Jeong

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Silicon Nanocrystals ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Exploring High Refractive Index Silicon-Rich Nitride Films by Low-Temperature Inductively Coupled Plasma Chemical Vapor Deposition and Applications for Integrated Waveguides

ACS Applied Materials & Interfaces ◽

10.1021/acsami.5b06329 ◽

2015 ◽

Vol 7 (39) ◽

pp. 21884-21889 ◽

Author(s):

Doris K. T. Ng ◽

Qian Wang ◽

Ting Wang ◽

Siu-Kit Ng ◽

Yeow-Teck Toh ◽

...

Keyword(s):

Refractive Index ◽

Chemical Vapor Deposition ◽

Low Temperature ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

High Refractive Index ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Non-catalytic direct synthesis of graphene on Si (111) wafers by using inductively-coupled plasma chemical vapor deposition

Journal of the Korean Physical Society ◽

10.3938/jkps.69.536 ◽

2016 ◽

Vol 69 (4) ◽

pp. 536-540

Author(s):

Sung Won Hwang ◽

Hyunho Shin ◽

Bongsoo Lee ◽

Suk-Ho Choi

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Direct Synthesis ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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High-density inductively coupled plasma chemical vapor deposition of silicon nitride for solar cell application

Solar Energy Materials and Solar Cells ◽

10.1016/s0927-0248(02)00053-3 ◽

2002 ◽

Vol 74 (1-4) ◽

pp. 97-105 ◽

Author(s):

I.O Parm ◽

K Kim ◽

D.G Lim ◽

J.H Lee ◽

J.H Heo ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Solar Cell Application ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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Inductively coupled plasma chemical vapor deposition silicon nitride for passivation of In 0.83 Ga 0.17 As photodiodes

Infrared Physics & Technology ◽

10.1016/j.infrared.2014.06.003 ◽

2014 ◽

Vol 67 ◽

pp. 197-201 ◽

Author(s):

Ming Shi ◽

Xiumei Shao ◽

Hengjing Tang ◽

Tao Li ◽

Yunji Wang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Silicon Nitride ◽

Vapor Deposition ◽

Inductively Coupled Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Inductively Coupled

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