Friction and wear properties of amorphous and nanocrystalline Ta-Ag films at elevated temperatures as function of working pressure

2018 ◽  
Vol 353 ◽  
pp. 135-147 ◽  
Author(s):  
Jun Wang ◽  
Jianliang Li ◽  
Hang Li ◽  
Xiafei Zhang ◽  
Jiewen Huang ◽  
...  
2008 ◽  
Vol 368-372 ◽  
pp. 961-963
Author(s):  
Hou An Zhang ◽  
Xiao Pin Hu ◽  
Wei Cheng Tan ◽  
Cun Shi

MoSi2 was prepared by SHS, and then pressed under 300 MPa at room temperature and sintered at 1600 °C for 1 h in a vacuum furnace. The tribological properties of MoSi2 against Al2O3 in the temperature range from 700°C to 1100 °C were investigated. Microphotographs and phases of the worn surface of MoSi2 were observed by SEM and XRD. Results showed that MoSi2 has well friction and wear properties below 900 °C. When temperature rises from 900 °C to 1000 °C, wear rate of MoSi2 is raised by 20.8% which is attribute to the change of wear mechanism. The main wear mechanisms of MoSi2 are adhesion and oxidation at high temperatures. When over 900 °C, because of ductile - brittle transition characteristic of this material, plastic deformation and fracture are also found on the worn surface of MoSi2. This leads to the high wear rate of MoSi2.


2018 ◽  
Vol 122 ◽  
pp. 228-235 ◽  
Author(s):  
Hui Tan ◽  
Shuai Wang ◽  
Yuan Yu ◽  
Jun Cheng ◽  
Shengyu Zhu ◽  
...  

2011 ◽  
Vol 43 (2) ◽  
pp. 221-228 ◽  
Author(s):  
Jianliang Li ◽  
Dangsheng Xiong ◽  
Yongkang Zhang ◽  
Heguo Zhu ◽  
Yongkun Qin ◽  
...  

1994 ◽  
Vol 116 (3) ◽  
pp. 445-453 ◽  
Author(s):  
B. K. Gupta ◽  
Ajay Malshe ◽  
Bharat Bhushan ◽  
Vish V. Subramaniam

The role of surface roughness on the coefficient of friction and wear of polished CVD diamond films has been investigated. Diamond films grown on single crystal silicon (001) substrates by Hot Filament Chemical Vapor Deposition (HFCVD) process were polished by a chemomechanical process in which a diamond film was polished against another diamond film in the presence of a fused alkaline oxidizer at 320°C. Friction and wear properties of these polished films were measured at elevated temperatures and in the presence of various gaseous environments. The coefficient of friction of the polished diamond films was found to be about 0.09, which is very close to that of natural diamond (0.07). The wear rate of the mating alumina ball slid against a polished diamond film was also found to be comparable, when slid natural diamond.


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