Optical, mechanical and etch properties of amorphous carbon nitride films grown by plasma enhanced chemical vapor deposition at room temperature

Synthetic Metals ◽

10.1016/j.synthmet.2010.09.024 ◽

2010 ◽

Vol 160 (23-24) ◽

pp. 2442-2446 ◽

Author(s):

Sang Hoon Kim ◽

Cheol Min Choi ◽

Kil Mok Lee ◽

Yoon-Bong Hahn

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Room Temperature ◽

Chemical Vapor ◽

Amorphous Carbon Nitride

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Fabrication of amorphous carbon nitride films by hot-wire chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(01)01264-0 ◽

2001 ◽

Vol 395 (1-2) ◽

pp. 249-252 ◽

Author(s):

Haruo Yokomichi ◽

Atsushi Masuda ◽

Naoki Kishimoto

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Hot Wire ◽

Amorphous Carbon Nitride

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Hydrogenated amorphous carbon nitride films on Si(100) deposited by direct current saddle-field plasma-enhanced chemical vapor deposition

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ◽

10.1116/1.581919 ◽

1999 ◽

Vol 17 (5) ◽

pp. 2607-2611 ◽

Author(s):

H. K. Jang ◽

G. Kim ◽

Y. S. Lee ◽

S. W. Whangbo ◽

C. N. Whang ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Direct Current ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Hydrogenated Amorphous Carbon ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Correlation of gas-phase composition with film properties in the plasma-enhanced chemical vapor deposition of hydrogenated amorphous carbon nitride films

Journal of Applied Physics ◽

10.1063/1.2424402 ◽

2007 ◽

Vol 101 (2) ◽

pp. 023304 ◽

Author(s):

Dongping Liu ◽

Jie Zhou ◽

Ellen R. Fisher

Keyword(s):

Phase Composition ◽

Chemical Vapor Deposition ◽

Gas Phase ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Film Properties ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Ion-Induced Processes in the Dissociative Excitation Reaction of BrCN to Synthesize Mechanically Hard Amorphous Carbon Nitride Films in the Microwave Plasma Chemical Vapor Deposition System

Japanese Journal of Applied Physics ◽

10.1143/jjap.41.3130 ◽

2002 ◽

Vol 41 (Part 1, No. 5A) ◽

pp. 3130-3136 ◽

Author(s):

Haruhiko Ito ◽

Kazuhiro Tanaka ◽

Akira Sato ◽

Noriko Ito ◽

Yoshiaki Ohkawara ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Dissociative Excitation ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Carbon Nitride

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Isobutane/N2Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications

Japanese Journal of Applied Physics ◽

10.7567/jjap.51.08hf04 ◽

2012 ◽

Vol 51 (8S1) ◽

pp. 08HF04

Author(s):

Haruhisa Kinoshita ◽

Sumio Tanaka

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Structural properties of amorphous carbon nitride films prepared by remote plasma-enhanced chemical vapor deposition

Thin Solid Films ◽

10.1016/s0040-6090(96)08906-7 ◽

1996 ◽

Vol 289 (1-2) ◽

pp. 79-83 ◽

Author(s):

Joo Han Kim ◽

Yong Hwan Kim ◽

Dong Jun Choi ◽

Hong Koo Baik

Keyword(s):

Chemical Vapor Deposition ◽

Structural Properties ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Remote Plasma ◽

Amorphous Carbon Nitride

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Pulsed Supermagnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films

Japanese Journal of Applied Physics ◽

10.1143/jjap.49.08jf07 ◽

2010 ◽

Vol 49 (8) ◽

pp. 08JF07 ◽

Author(s):

Haruhisa Kinoshita ◽

Atsushi Yamaguchi

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Hydrogenated Amorphous Carbon ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Isobutane/N$_{2}$ Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications

Japanese Journal of Applied Physics ◽

10.1143/jjap.51.08hf04 ◽

2012 ◽

Vol 51 ◽

pp. 08HF04 ◽

Author(s):

Haruhisa Kinoshita ◽

Sumio Tanaka

Keyword(s):

Chemical Vapor Deposition ◽

Field Emission ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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Room temperature deposition of hydrogenated amorphous carbon films from laser-assisted photolytic chemical vapor deposition at 248 nm

Thin Solid Films ◽

10.1016/s0040-6090(01)01193-2 ◽

2001 ◽

Vol 394 (1-2) ◽

pp. 114-123 ◽

Author(s):

M Lindstam

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Carbon ◽

Vapor Deposition ◽

Room Temperature ◽

Chemical Vapor ◽

Carbon Films ◽

Amorphous Carbon Films ◽

Hydrogenated Amorphous Carbon ◽

Temperature Deposition ◽

Hydrogenated Amorphous

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Effects of deposition gas pressure on the properties of hydrogenated amorphous carbon nitride films grown by surface wave microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2004.12.040 ◽

2005 ◽

Vol 14 (3-7) ◽

pp. 975-982 ◽

Author(s):

M. Rusop ◽

A.M.M. Omer ◽

S. Adhikari ◽

S. Adhikary ◽

H. Uchida ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Surface Wave ◽

Vapor Deposition ◽

Carbon Nitride ◽

Microwave Plasma ◽

Chemical Vapor ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Amorphous Carbon Nitride ◽

Hydrogenated Amorphous

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