Effects of deposition gas pressure on the properties of hydrogenated amorphous carbon nitride films grown by surface wave microwave plasma chemical vapor deposition
2005 ◽
Vol 14
(3-7)
◽
pp. 975-982
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2002 ◽
Vol 41
(Part 1, No. 5A)
◽
pp. 3130-3136
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2010 ◽
Vol 49
(8)
◽
pp. 08JF07
◽
2012 ◽
Vol 51
◽
pp. 08HF04
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1989 ◽
Vol 50
(C5)
◽
pp. C5-667-C5-672
2009 ◽
Vol 23
(09)
◽
pp. 2159-2165
◽
1999 ◽
Vol 254
(1-3)
◽
pp. 180-185
◽
2005 ◽
Vol 480-481
◽
pp. 71-76
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