Isobutane/N2Pulsed Radio Frequency Magnetron Plasma Chemical Vapor Deposition of Hydrogenated Amorphous Carbon Nitride Films for Field Emission Applications
2012 ◽
Vol 51
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pp. 08HF04
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2010 ◽
Vol 49
(8)
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pp. 08JF07
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2005 ◽
Vol 14
(3-7)
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pp. 975-982
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2002 ◽
Vol 41
(Part 1, No. 5A)
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pp. 3130-3136
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2009 ◽
Vol 23
(09)
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pp. 2159-2165
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2008 ◽
Vol 255
(5)
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pp. 1836-1840
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1999 ◽
Vol 17
(5)
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pp. 2607-2611
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