Comparison of ordered structure in buried oxide layers in high-dose, low-dose, and internal-thermal-oxidation separation-by-implanted-oxygen wafers

2005 ◽  
Vol 476 (1) ◽  
pp. 125-129
Author(s):  
T. Shimura ◽  
K. Fukuda ◽  
K. Yasutake ◽  
T. Hosoi ◽  
M. Umeno
Keyword(s):  
Thermal Oxidation ◽  
Low Dose ◽  
High Dose ◽  
Ordered Structure ◽  
Oxide Layers ◽  
Buried Oxide

ChemInform Abstract: Growth of Buried Oxide Layers of Silicon-on-Insulator (SOI) Structures by Thermal Oxidation of the Top Silicon Layer.

ChemInform ◽  
2010 ◽  
Vol 28 (43) ◽  
pp. no-no
Author(s):  
E. SCHROER ◽  
S. HOPFE ◽  
Q. Y. TONG ◽  
U. GOESELE ◽  
W. SKORUPA
Keyword(s):  
Thermal Oxidation ◽  
Silicon Layer ◽  
Silicon On Insulator ◽  
Oxide Layers ◽  
Buried Oxide

Buried oxide layers formed by low dose SIMOX processes

1995 ◽  
Vol 28 (1-4) ◽  
pp. 411-414 ◽  
Author(s):  
B. Aspar ◽  
C. Guilhalmenc ◽  
C. Pudda ◽  
A. Garcia ◽  
A.M. Papon ◽  
...  
Keyword(s):  
Low Dose ◽  
Oxide Layers ◽  
Buried Oxide

A thermodynamic model for the growth of buried oxide layers by thermal oxidation

1996 ◽  
Vol 36 (1-3) ◽  
pp. 237-240 ◽  
Author(s):  
E. Schroer ◽  
S. Hopfe ◽  
J.-Y. Huh ◽  
U. Gösele
Keyword(s):  
Thermal Oxidation ◽  
Thermodynamic Model ◽  
Oxide Layers ◽  
Buried Oxide

Growth of Buried Oxide Layers of Silicon‐on‐Insulator Structures by Thermal Oxidation of the Top Silicon Layer

1997 ◽  
Vol 144 (6) ◽  
pp. 2205-2210 ◽  
Author(s):  
E. Schroer ◽  
S. Hopfe ◽  
Q. Y. Tong ◽  
U. Gösele ◽  
W. Skorupa
Keyword(s):  
Thermal Oxidation ◽  
Silicon Layer ◽  
Silicon On Insulator ◽  
Oxide Layers ◽  
Buried Oxide

Optical and compositional studies of buried oxide layers in silicon formed by high dose implantation

1987 ◽  
Vol 30 (1-4) ◽  
pp. 390-396 ◽  
Author(s):  
R.J. Chater ◽  
J.A. Kilner ◽  
E. Scheid ◽  
S. Cristoloveneau ◽  
P.L.F. Hemment ◽  
...  
Keyword(s):  
High Dose ◽  
Oxide Layers ◽  
Buried Oxide ◽  
High Dose Implantation

C-V and C-t analysis of buried oxide layers formed by high-dose oxygen implantation

1989 ◽  
Vol 18 (3) ◽  
pp. 385-389 ◽  
Author(s):  
F. T. Brady ◽  
S. S. Li ◽  
W. A. Krull
Keyword(s):  
High Dose ◽  
Oxide Layers ◽  
Oxygen Implantation ◽  
Buried Oxide

Dose-energy match for the formation of high-integrity buried oxide layers in low-dose separation-by-implantation-of-oxygen materials

2002 ◽  
Vol 80 (5) ◽  
pp. 880-882 ◽  
Author(s):  
Meng Chen ◽  
Xiang Wang ◽  
Jing Chen ◽  
Xianghua Liu ◽  
Yeming Dong ◽  
...  
Keyword(s):  
Low Dose ◽  
Oxide Layers ◽  
Buried Oxide ◽  
High Integrity

Low/very low dose and multi-buried oxide layers SIMOX materials formed from appropriate dose-energy matches

2002 ◽  
Author(s):  
Meng Chen ◽  
Xi Wang Xiang Wang ◽  
Yeming Dong ◽  
Xianghua Liu ◽  
Wangbin Yi ◽  
...  
Keyword(s):  
Low Dose ◽  
Oxide Layers ◽  
Buried Oxide
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