Structure of reactively sputter deposited tin-nitride thin films: A combined X-ray photoelectron spectroscopy, in situ X-ray reflectivity and X-ray absorption spectroscopy study

2005 ◽  
Vol 493 (1-2) ◽  
pp. 67-76 ◽  
Author(s):  
Dirk Lützenkirchen-Hecht ◽  
Ronald Frahm
2015 ◽  
Vol 119 (8) ◽  
pp. 4362-4370 ◽  
Author(s):  
D. Carta ◽  
G. Mountjoy ◽  
A. Regoutz ◽  
A. Khiat ◽  
A. Serb ◽  
...  

2011 ◽  
Vol 50 (43) ◽  
pp. 10190-10192 ◽  
Author(s):  
Daniel Friebel ◽  
Daniel J. Miller ◽  
Dennis Nordlund ◽  
Hirohito Ogasawara ◽  
Anders Nilsson

Author(s):  
Washington C.M. Gomes ◽  
Alcides de Oliveira Wanderley Neto ◽  
Patrícia Mendonça Pimentel ◽  
Dulce Maria de Araújo Melo ◽  
Fabiana Roberta Gonçalves e Silva

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