Self-standing device-quality single-crystalline diamond films on vicinal (001) surfaces fabricated using microwave-plasma chemical-vapor-deposition method

Vapor Deposition ◽

Microwave Plasma ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Single Crystalline ◽

Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Cited By ~ 5

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Thin Films ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Cited By ~ 5

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Cited By ~ 11

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/678/1/012166 ◽

2019 ◽

Vol 678 ◽

pp. 012166

Author(s):

Chunlei Wu ◽

Yanfeng Liu ◽

Guodong Hao ◽

Ruihua Zhu

Keyword(s):

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Growth Behavior ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

The structural and surface properties of carbon nanotube synthesized by microwave plasma chemical vapor deposition method for superhydrophobic coating

Thin Solid Films ◽

10.1016/j.tsf.2013.05.018 ◽

2013 ◽

Vol 546 ◽

pp. 94-97 ◽

Cited By ~ 13

Author(s):

Jae-Hyeong Lee ◽

Su Ho Lee ◽

Doyoung Kim ◽

Yong Seob Park

Keyword(s):

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Superhydrophobic Coating ◽

Plasma Chemical ◽

Influence of Sr Content on Tl-Ba-Sr-Ca-Cu-O Superconducting Thin Films Prepared by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.34.l109 ◽

1995 ◽

Vol 34 (Part 2, No. 1B) ◽

pp. L109-L111 ◽

Cited By ~ 3

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Diamond growth on CoSi2/Si by bias-enhanced microwave plasma chemical vapor deposition method

Materials Chemistry and Physics ◽

10.1016/s0254-0584(01)00430-8 ◽

2001 ◽

Vol 72 (2) ◽

pp. 172-175 ◽

Cited By ~ 3

Author(s):

Mao Rong Chen ◽

Li Chang ◽

Der Fu Chang ◽

Hou Guang Chen

Keyword(s):

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Diamond Growth ◽

Deposition Method ◽

Plasma Chemical ◽

The effect of Pb addition on Bi-Sr-Ca-Cu-O superconducting thin films prepared by the mist microwave-plasma chemical vapor deposition method

Journal of Crystal Growth ◽

10.1016/0022-0248(94)90008-6 ◽

1994 ◽

Vol 144 (1-2) ◽

pp. 48-53 ◽

Cited By ~ 10

Author(s):

Naoyuki Takahashi ◽

Akinori Koukito ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Relationship between crystal structures and Pb addition of TlSrCaCuO superconducting thin films prepared by the mist microwave plasma chemical vapor deposition method

Journal of Crystal Growth ◽

10.1016/0022-0248(95)00038-0 ◽

1995 ◽

Vol 151 (3-4) ◽

pp. 300-304

Author(s):

N. Takahashi ◽

A. Koukitu ◽

H. Seki

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Nanocrystalline Diamond Films Deposited by the Hot Cathode Direct Current Plasma Chemical Vapor Deposition Method with Different Compositions of CH4/Ar/H2Gas Mixture

The Journal of Physical Chemistry C ◽

10.1021/jp710082n ◽

2008 ◽

Vol 112 (5) ◽

pp. 1401-1406 ◽

Cited By ~ 15

Author(s):

Leyong Zeng ◽

Hongyan Peng ◽

Weibiao Wang ◽

Yuqiang Chen ◽

Da Lei ◽

...

Keyword(s):

Direct Current ◽

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma