Stress buildup during crystallization of thin chalcogenide films for memory applications: In situ combination of synchrotron X-Ray diffraction and wafer curvature measurements

2016 ◽  
Vol 617 ◽  
pp. 44-47 ◽  
Author(s):  
T. Ouled-Khachroum ◽  
M.-I. Richard ◽  
P. Noé ◽  
C. Guichet ◽  
C. Mocuta ◽  
...  
Keyword(s):  
X Ray Diffraction ◽  
X Ray ◽  
Wafer Curvature ◽  
Chalcogenide Films ◽  
Curvature Measurements ◽  
Memory Applications ◽  
Stress Buildup

Combined synchrotron x-ray diffraction and wafer curvature measurements during Ni–Si reactive film formation

2005 ◽  
Vol 87 (4) ◽  
pp. 041904 ◽  
Author(s):  
C. Rivero ◽  
P. Gergaud ◽  
M. Gailhanou ◽  
O. Thomas ◽  
B. Froment ◽  
...  
Keyword(s):  
Film Formation ◽  
X Ray Diffraction ◽  
X Ray ◽  
Wafer Curvature ◽  
Curvature Measurements

Strain profiling of AlInN/GaN distributed Bragg reflectors using in situ curvature measurements and ex situ X-ray diffraction

2010 ◽  
Vol 528 (1) ◽  
pp. 58-64 ◽  
Author(s):  
C. Berger ◽  
P. Moser ◽  
A. Dadgar ◽  
J. Bläsing ◽  
R. Clos ◽  
...  
Keyword(s):  
Ex Situ ◽  
Bragg Reflectors ◽  
Distributed Bragg Reflectors ◽  
X Ray Diffraction ◽  
X Ray ◽  
Curvature Measurements

The Use of Advanced Analytical Techniques for Characterization of the Chemical, Physical, and Crystallographic Nature of a Surface

1973 ◽  
Vol 31 ◽  
pp. 132-133 ◽  
Author(s):  
R. E. Herfert
Keyword(s):  
Surface Characterization ◽  
Analytical Techniques ◽  
X Ray Diffraction ◽  
Depth Of Penetration ◽  
X Ray ◽  
The Past ◽  
Transmission Electron ◽  
Scanning Electron

Studies of the nature of a surface, either metallic or nonmetallic, in the past, have been limited to the instrumentation available for these measurements. In the past, optical microscopy, replica transmission electron microscopy, electron or X-ray diffraction and optical or X-ray spectroscopy have provided the means of surface characterization. Actually, some of these techniques are not purely surface; the depth of penetration may be a few thousands of an inch. Within the last five years, instrumentation has been made available which now makes it practical for use to study the outer few 100A of layers and characterize it completely from a chemical, physical, and crystallographic standpoint. The scanning electron microscope (SEM) provides a means of viewing the surface of a material in situ to magnifications as high as 250,000X.

In-situ Investigation of Bainite Formation with fast X-Ray Diffraction (iXRD)

2017 ◽  
Vol 72 (6) ◽  
pp. 355-364
Author(s):  
A. Kopp ◽  
T. Bernthaler ◽  
D. Schmid ◽  
G. Ketzer-Raichle ◽  
G. Schneider
Keyword(s):  
X Ray Diffraction ◽  
X Ray ◽  
In Situ Investigation
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