Influence of reacting gas content on structural and electro-physical properties of nanostructured diamond films grown by chemical vapor deposition with crossed E/H field glow discharge stabilization

2016 ◽  
Vol 616 ◽  
pp. 297-302 ◽  
Author(s):  
Iurii Nasieka ◽  
Victor Strelchuk ◽  
Yuriy Stubrov ◽  
Stanislav Dudnik ◽  
Konstantin Koshevoy ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Glow Discharge ◽  
Physical Properties ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Gas Content

Characterization of chemical bonding and physical characteristics of diamond-like amorphous carbon and diamond films

1992 ◽  
Vol 7 (2) ◽  
pp. 404-410 ◽  
Author(s):  
Bharat Bhushan ◽  
Andrew J. Kellock ◽  
Nam-Hee Cho ◽  
Joel W. Ager
Keyword(s):  
Chemical Vapor Deposition ◽  
Physical Properties ◽  
Amorphous Carbon ◽  
Vapor Deposition ◽  
Microwave Plasma ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Bulk Diamond

Diamond-like (amorphous) carbon (DLC) films were prepared by dc magnetron sputtering and plasma enhanced chemical vapor deposition (PECVD) and diamond films were prepared by microwave plasma enhanced chemical vapor deposition (MPECVD). For the first time, chemical and mechanical characterization of the films from each category are carried out systematically and a comparison of the chemical and physical properties is provided. We find that DLC coatings produced by PECVD are superior in microhardness and modulus of elasticity to those produced by sputtering. PECVD films contain a larger fraction of sp3-bonding than the sputtered hydrogenated carbon films. Chemical and physical properties of the diamond films appear to be close to those of bulk diamond.

Nano-diamond films deposited by direct current glow discharge assisted chemical vapor deposition

2000 ◽  
Vol 9 (3-6) ◽  
pp. 866-871 ◽  
Author(s):  
A. Heiman ◽  
I. Gouzman ◽  
S.H. Christiansen ◽  
H.P. Strunk ◽  
A. Hoffman
Keyword(s):  
Chemical Vapor Deposition ◽  
Glow Discharge ◽  
Direct Current ◽  
Vapor Deposition ◽  
Diamond Films ◽  
Chemical Vapor

Examination of the material properties and performance of thin-diamond film cutting tool inserts produced by arc-jet and hot filament chemical vapor deposition

1996 ◽  
Vol 11 (7) ◽  
pp. 1765-1775 ◽  
Author(s):  
James M. Olson ◽  
Michael J. Dawes
Keyword(s):  
Wear Resistance ◽  
Chemical Vapor Deposition ◽  
Diamond Film ◽  
Vapor Deposition ◽  
Cutting Tool ◽  
Diamond Films ◽  
Chemical Vapor ◽  
Polycrystalline Diamond ◽  
And Performance ◽  
Hot Filament

Thin diamond film coated WC-Co cutting tool inserts were produced using arc-jet and hot-filament chemical vapor deposition. The diamond films were characterized using SEM, XRD, and Raman spectroscopy to examine crystal structure, fracture mode, thickness, crystalline orientation, diamond quality, and residual stress. The performance of the tools was evaluated by comparing the wear resistance of the materials to brazed polycrystalline diamond-tipped cutting tool inserts (PCD) while machining A390 aluminum (18% silicon). Results from the experiments carried out in this study suggest that the wear resistance of the thin diamond films is primarily related to the grain boundary strength, crystal orientation, and the density of microdefects in the diamond film.

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