The process of preparation of tellurium epitaxial films and layers with high structural perfection during vapor-deposition process in the pure hydrogen environment

The work is devoted to studying a new methodology for epitaxial films preparation on the mi-ca (muscovite) plates and based on carrying out the tellurium vapor-deposition process in the pure hydrogen environment. The formation of Н2Te molecules during reaction of H2 with sol-id Te in the hot zone, diffusion of Н2Te towards the cold surface with efficient thermalization due to high thermal conductivity of H2, Н2Te dissociative adsorption on the growth surface followed by H2 desorption and atomic Te accumulation are considered as key steps of crystal-line epitaxial films formation. Atomic Te assists the appearance and growth of directional liquid nucleuses at cold plate temperatures near Te melting point (about 450C). During coa-lescence of these liquid nucleuses the gradual formation of a liquid film is observed with a mosaic of voids of various size. After continuous liquid sheet formation, auto-epitaxial film growth begins also taking place according to vapor-liquid-crystal process described. The structural perfection of films formed is closed to three-dimensional monocrystalline samples. As a result, Te films with such characteristics may be put to use in various branches of micro-, opto-, acoustoelectronics.

A two-step chemical vapor deposition process for the growth of continuous vertical heterostructure WSe2/h-BN and its optical properties

Direct growth of WSe2 on hexagonal boron nitride via a two step CVD process.

Comparison of diamond nanoparticles captured on the floating and grounded membranes in the hot filament chemical vapor deposition process

Various carbon allotropes were captured on the floating and grounded membrane.

Water-Resistant Mechanoluminescent Electrospun Fabrics with Protected Sensitivity in Wet Condition via Plasma-Enhanced Chemical Vapor Deposition Process

Mechanoluminescence (ML), which emits light upon external mechanical stress, was applied to fibrous composites. Herein, ML particles were incorporated into poly(vinylidene fluoride) (PVDF) and polyacrylonitrile (PAN) electrospun webs to prepare ML/PVDF and ML/PAN composite fabrics. The produced fabrics were treated with O2 and C4F8 plasma to modify the wetting properties, then the effects of composite wettability on the light-emitting response in dry and wet conditions were investigated. The light intensity was greatly decreased when the composite fabrics absorbed water. When the composites were hydrophobized by the C4F8 plasma-enhanced chemical vapor deposition process, the original light intensity was protected in wet conditions, while maintaining the water vapor transmission rate. As the clothing material would be exposed to moisture in varied situations, the reduced ML sensitivity in wet conditions may limit the application of ML composite fabrics. The findings suggest a facile strategy to fabricate moisture-resistant, breathable mechanoluminescence composite fabrics.