Effects of deposition temperature on structure and properties of mo-doped indium oxide by radio frequency magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2010.05.016 ◽

2010 ◽

Vol 85 (2) ◽

pp. 211-213

Author(s):

Yang Hai ◽

Zhang Shu-yu ◽

Liu Wei ◽

Yuan Guo ◽

Li Jian-Ming ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Deposition Temperature ◽

Radio Frequency Magnetron ◽

Structure And Properties ◽

Radio Frequency Magnetron Sputtering

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Influence of substrate bias on the structure and properties of TiCN films deposited by radio-frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2016.08.047 ◽

2016 ◽

Vol 616 ◽

pp. 521-529 ◽

Author(s):

N. Saoula ◽

N. Madaoui ◽

R. Tadjine ◽

R.M. Erasmus ◽

S. Shrivastava ◽

...

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Substrate Bias ◽

Structure And Properties ◽

Radio Frequency Magnetron Sputtering ◽

Influence Of Substrate

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Tungsten Doped Indium Oxide Thin Films Deposited at Room Temperature by Radio Frequency Magnetron Sputtering

Journal of Material Science and Technology ◽

10.1016/j.jmst.2013.10.023 ◽

2014 ◽

Vol 30 (7) ◽

pp. 644-648 ◽

Author(s):

Jiaojiao Pan ◽

Wenwen Wang ◽

Dongqi Wu ◽

Qiang Fu ◽

Ding Ma

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Room Temperature ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films

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Preliminary studies on molybdenum-doped indium oxide thin films deposited by radio-frequency magnetron sputtering at room temperature

Thin Solid Films ◽

10.1016/j.tsf.2007.01.022 ◽

2007 ◽

Vol 515 (13) ◽

pp. 5512-5518 ◽

Author(s):

E. Elangovan ◽

A. Marques ◽

F.M. Braz Fernandes ◽

R. Martins ◽

E. Fortunato

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Room Temperature ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films

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Morphology and structure evolution of tin-doped indium oxide thin films deposited by radio-frequency magnetron sputtering: The role of the sputtering atmosphere

Journal of Applied Physics ◽

10.1063/1.4871810 ◽

2014 ◽

Vol 115 (15) ◽

pp. 154905 ◽

Author(s):

Man Nie ◽

Tayfun Mete ◽

Klaus Ellmer

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Radio Frequency Magnetron ◽

Structure Evolution ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Morphology And Structure

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Effects of hydrogen gas on properties of tin-doped indium oxide films deposited by radio frequency magnetron sputtering method

Thin Solid Films ◽

10.1016/j.tsf.2007.02.056 ◽

2007 ◽

Vol 515 (17) ◽

pp. 6949-6952 ◽

Author(s):

Do-Geun Kim ◽

Sunghun Lee ◽

Gun-Hwan Lee ◽

Sik-Chol Kwon

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Oxide Films ◽

Hydrogen Gas ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Indium Oxide Films

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Effect of deposition temperature on the microstructure and electrical properties of Ba0.8Sr0.2TiO3 thin films deposited by radio-frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2007.11.122 ◽

2008 ◽

Vol 516 (10) ◽

pp. 3416-3421 ◽

Author(s):

G.C. Jha ◽

S.K. Ray ◽

I. Manna

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Deposition Temperature ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering

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Electrical and Optical Properties of Eu-Doped Indium Oxide Thin Films Deposited by Radio-Frequency Magnetron Sputtering

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2014.10081 ◽

2014 ◽

Vol 14 (12) ◽

pp. 8982-8986 ◽

Author(s):

Jong-Kwan Woo ◽

Shinho Cho

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

Electrical And Optical Properties

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Changes in the structural and electrical properties of vacuum post-annealed tungsten- and titanium-doped indium oxide films deposited by radio frequency magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2011.08.060 ◽

2012 ◽

Vol 520 (6) ◽

pp. 2096-2101 ◽

Author(s):

L.T. Yan ◽

R.E.I. Schropp

Keyword(s):

Electrical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Oxide Films ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Structural And Electrical Properties ◽

Indium Oxide Films

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Structure and properties of gallium nitride thin films deposited on Si (111) by using radio-frequency magnetron sputtering

Journal of the Korean Physical Society ◽

10.3938/jkps.62.619 ◽

2013 ◽

Vol 62 (4) ◽

pp. 619-622 ◽

Author(s):

Joo Han Kim ◽

Yeon Ki Cho

Keyword(s):

Gallium Nitride ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Radio Frequency Magnetron ◽

Structure And Properties ◽

Radio Frequency Magnetron Sputtering

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Germanium‐ and silicon‐doped indium‐oxide thin films prepared by radio‐frequency magnetron sputtering

Applied Physics Letters ◽

10.1063/1.111894 ◽

1994 ◽

Vol 64 (11) ◽

pp. 1395-1397 ◽

Author(s):

Toshiro Maruyama ◽

Teruoki Tago

Keyword(s):

Magnetron Sputtering ◽

Radio Frequency ◽

Indium Oxide ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Oxide Thin Films ◽

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