Micromachined silicon cantilever beams for thin-film stress measurement

1996 ◽  
Vol 287 (1-2) ◽  
pp. 214-219 ◽  
Author(s):  
G.F. Cardinale ◽  
D.G. Howitt ◽  
W.M. Clift ◽  
K.F. McCarty ◽  
D.L. Medlin ◽  
...  
2006 ◽  
Vol 494 (1-2) ◽  
pp. 141-145 ◽  
Author(s):  
S.M.M. Quintero ◽  
W.G. Quirino ◽  
A.L.C. Triques ◽  
L.C.G. Valente ◽  
A.M.B. Braga ◽  
...  

2018 ◽  
Vol 89 (5) ◽  
pp. 053904 ◽  
Author(s):  
J. Reinink ◽  
R. W. E. van de Kruijs ◽  
F. Bijkerk

1997 ◽  
Vol 301 (1-2) ◽  
pp. 45-54 ◽  
Author(s):  
S.G Malhotra ◽  
Z.U Rek ◽  
S.M Yalisove ◽  
J.C Bilello

1998 ◽  
Vol 546 ◽  
Author(s):  
P. Zhang ◽  
R. P. Vinci ◽  
J. C. Bravman ◽  
T. W. Kenny

AbstractA new technique of measuring thin film stress with a tunneling sensor is presented. Basic measurement concepts, preliminary results on thin film stress measurement, and fabrication processes for the tunneling stress measurement sensor are described. The feasibility of implementing this technique for in-situ stress monitoring during thin film deposition demonstrated.


1996 ◽  
Author(s):  
George E. Dovgalenko ◽  
M. S. Haque ◽  
Anatoli Kniazkov ◽  
Yuri I. Onischenko ◽  
Gregory J. Salamo ◽  
...  

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