Growth and characterization of AP-MOCVD iron doped titanium dioxide thin films

1999 ◽  
Vol 340 (1-2) ◽  
pp. 175-182 ◽  
Author(s):  
V. Gauthier ◽  
S. Bourgeois ◽  
P. Sibillot ◽  
M. Maglione ◽  
M. Sacilotti
2018 ◽  
Vol 10 (2) ◽  
Author(s):  
M. Luqman Harith Abu Mansor ◽  
◽  
Rosniza Hussin ◽  
Zakiah Kamdi ◽  
Ainun Rahmahwati Ainuddin ◽  
...  

2018 ◽  
Vol 33 (24) ◽  
pp. 4165-4172 ◽  
Author(s):  
Deepak Kumar ◽  
Prasanta Mandal ◽  
Anil Singh ◽  
Charu Pant ◽  
Sudesh Sharma

Abstract


2016 ◽  
Vol 2 (02) ◽  
pp. 61
Author(s):  
Mukhtar Effendi ◽  
Bilalodin B

<span>Iron (Fe) doped titanium dioxide (TiO<span>2<span>) thin films have been successfully deposited by <span>using spin coating technique. X-ray diffraction (XRD) and Scanning Electron Microscope <span>(SEM) were employed to characterize the microstructure and crystallite morphology of the <span>films. It was indicated that the rutile crystal orientation appears due to increasing annealing <span>temperature of the thin films. Furthermore, increasing annealing temperature of the thin <span>films yielded an increasing of porosity value which is related to the application on gas <span>sensor films.</span></span></span></span></span></span><br /></span></span></span>


2006 ◽  
Vol 97 (1) ◽  
pp. 5-9 ◽  
Author(s):  
H.M. Pathan ◽  
Sun-Ki Min ◽  
J.D. Desai ◽  
Kwang-Deog Jung ◽  
Oh-Shim Joo

Vacuum ◽  
2008 ◽  
Vol 82 (10) ◽  
pp. 1007-1012 ◽  
Author(s):  
Jaroslaw Domaradzki ◽  
Danuta Kaczmarek ◽  
Agnieszka Borkowska ◽  
Dieter Schmeisser ◽  
Sebastian Mueller ◽  
...  

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