Investigation of SOI photonic crystals fabricated by both electron-beam lithography and nanoimprint lithography

2004 ◽  
Vol 73-74 ◽  
pp. 405-411 ◽  
Author(s):  
M BELOTTI
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Nanoimprint Lithography

Formation Of Two-Dimensional Photonic Crystals With Cavities Arrays In Silicon

2016 ◽  
Vol 11 (1) ◽  
pp. 88-93
Author(s):  
Dmitriy Utkin ◽  
Aleksandr Shklyaev ◽  
Fedor Dultsev ◽  
Aleksandr Latyshev
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Spatial Distributions ◽  
Two Dimensional ◽  
Interference Effects ◽  
Technological Parameters ◽  
Beam Interaction ◽  
Cavity Array ◽  
Better Than

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.

Fast nanopatterning of two-dimensional photonic crystals by electron beam lithography

2004 ◽  
Vol 36 (1-3) ◽  
pp. 265-270 ◽  
Author(s):  
T. Stomeo ◽  
A. Passaseo ◽  
R. Cingolani ◽  
M. De Vittorio
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Two Dimensional

scholarly journals Structuring of self-assembled three-dimensional photonic crystals by direct electron-beam lithography

2003 ◽  
Vol 83 (25) ◽  
pp. 5289-5291 ◽  
Author(s):  
P. Ferrand ◽  
M. Egen ◽  
R. Zentel ◽  
J. Seekamp ◽  
S. G. Romanov ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Three Dimensional ◽  
Self Assembled

scholarly journals Silicon Metalens Fabrication from Electron Beam to UV-Nanoimprint Lithography

Nanomaterials ◽  
2021 ◽  
Vol 11 (9) ◽  
pp. 2329
Author(s):  
Angela Mihaela Baracu ◽  
Marius Andrei Avram ◽  
Carmen Breazu ◽  
Mihaela-Cristina Bunea ◽  
Marcela Socol ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Pattern Transfer ◽  
Silicon Substrates ◽  
Ion Etching ◽  
Deep Reactive Ion Etching ◽  
Transfer Processes ◽  
Low Efficiency ◽  
Design And Manufacture

This study presents the design and manufacture of metasurface lenses optimized for focusing light with 1.55 µm wavelength. The lenses are fabricated on silicon substrates using electron beam lithography, ultraviolet-nanoimprint lithography and cryogenic deep reactive-ion etching techniques. The designed metasurface makes use of the geometrical phase principle and consists of rectangular pillars with target dimensions of height h = 1200 nm, width w = 230 nm, length l = 354 nm and periodicity p = 835 nm. The simulated efficiency of the lens is 60%, while the master lenses obtained by using electron beam lithography are found to have an efficiency of 45%. The lenses subsequently fabricated via nanoimprint are characterized by an efficiency of 6%; the low efficiency is mainly attributed to the rounding of the rectangular nanostructures during the pattern transfer processes from the resist to silicon due to the presence of a thicker residual layer.

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