Large area mold fabrication for the nanoimprint lithography using electron beam lithography

2010 ◽  
Vol 53 (1) ◽  
pp. 248-252 ◽  
Author(s):  
JinKui Chu ◽  
FanTao Meng ◽  
ZhiTao Han ◽  
Qing Guo
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Large Area ◽  
Mold Fabrication

scholarly journals Mastering of NIL Stamps with Undercut T-Shaped Features from Single Layer to Multilayer Stamps

Nanomaterials ◽  
2021 ◽  
Vol 11 (4) ◽  
pp. 956
Author(s):  
Philipp Taus ◽  
Adrian Prinz ◽  
Heinz D. Wanzenboeck ◽  
Patrick Schuller ◽  
Anton Tsenov ◽  
...  
Keyword(s):  
Electron Beam Lithography ◽  
Nanoimprint Lithography ◽  
Silicon Oxide ◽  
Three Dimensional ◽  
Single Layer ◽  
Fabrication Technology ◽  
Large Area ◽  
Structural Colors ◽  
Biomimetic Structures ◽  
Morpho Butterfly

Biomimetic structures such as structural colors demand a fabrication technology of complex three-dimensional nanostructures on large areas. Nanoimprint lithography (NIL) is capable of large area replication of three-dimensional structures, but the master stamp fabrication is often a bottleneck. We have demonstrated different approaches allowing for the generation of sophisticated undercut T-shaped masters for NIL replication. With a layer-stack of phase transition material (PTM) on poly-Si, we have demonstrated the successful fabrication of a single layer undercut T-shaped structure. With a multilayer-stack of silicon oxide on silicon, we have shown the successful fabrication of a multilayer undercut T-shaped structures. For patterning optical lithography, electron beam lithography and nanoimprint lithography have been compared and have yielded structures from 10 µm down to 300 nm. The multilayer undercut T-shaped structures closely resemble the geometry of the surface of a Morpho butterfly, and may be used in future to replicate structural colors on artificial surfaces.

A master-mold fabrication by electron beam lithography followed by nanoimprinting and self-aligned double patterning

2014 ◽  
Vol 53 (6S) ◽  
pp. 06JK05 ◽  
Author(s):  
Tsuyoshi Watanabe ◽  
Kouta Suzuki ◽  
Hiromasa Iyama ◽  
Takeshi Kagatsume ◽  
Shuji Kishimoto ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Master Mold ◽  
Mold Fabrication ◽  
Double Patterning

Plasma-assisted filling electron beam lithography for high throughput patterning of large area closed polygon nanostructures

Nanoscale ◽  
2020 ◽  
Vol 12 (19) ◽  
pp. 10584-10591 ◽  
Author(s):  
You Sin Tan ◽  
Hailong Liu ◽  
Qifeng Ruan ◽  
Hao Wang ◽  
Joel K. W. Yang
Keyword(s):  
Electron Beam ◽  
Plasma Treatment ◽  
High Throughput ◽  
Electron Beam Lithography ◽  
Large Area ◽  
Post Exposure ◽  
Closed Polygon

The PFEBL process allows enhancement of electron beam writing efficiency for patterning of closed polygon structures using a post-exposure plasma treatment.

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