Direct electron-beam lithography on opal films for deterministic defect fabrication in three-dimensional photonic crystals

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.

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Fabrication of three-dimensional suspended, interlayered and hierarchical nanostructures by accuracy-improved electron beam lithography overlay

Scientific Reports ◽

10.1038/s41598-017-06833-5 ◽

2017 ◽

Vol 7 (1) ◽

Cited By ~ 16

Author(s):

Gwanho Yoon ◽

Inki Kim ◽

Sunae So ◽

Jungho Mun ◽

Minkyung Kim ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Hierarchical Nanostructures

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Fast nanopatterning of two-dimensional photonic crystals by electron beam lithography

Superlattices and Microstructures ◽

10.1016/j.spmi.2004.08.019 ◽

2004 ◽

Vol 36 (1-3) ◽

pp. 265-270 ◽

Cited By ~ 10

Author(s):

T. Stomeo ◽

A. Passaseo ◽

R. Cingolani ◽

M. De Vittorio

Keyword(s):

Electron Beam ◽

Photonic Crystals ◽

Electron Beam Lithography ◽

Two Dimensional

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Three-Dimensional in Situ Electron-Beam Lithography Using Water Ice

Nano Letters ◽

10.1021/acs.nanolett.8b01857 ◽

2018 ◽

Vol 18 (8) ◽

pp. 5036-5041 ◽

Cited By ~ 18

Author(s):

Yu Hong ◽

Ding Zhao ◽

Dongli Liu ◽

Binze Ma ◽

Guangnan Yao ◽

...

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Water Ice

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Fabrication of bio-inspired 3D nanoimprint mold using acceleration-voltage-modulation electron-beam lithography

Advanced Optical Technologies ◽

10.1515/aot-2019-0017 ◽

2019 ◽

Vol 8 (3-4) ◽

pp. 289-297 ◽

Cited By ~ 1

Author(s):

Kohei Goto ◽

Jun Taniguchi

Keyword(s):

Electron Beam ◽

Electron Beam Lithography ◽

Three Dimensional ◽

Modulation Method ◽

Imprint Lithography ◽

3D Structures ◽

Rose Petal ◽

Rose Petals ◽

Acceleration Voltage ◽

Nano Imprint

Abstract Methods for fabricating micro- and nanoscale three-dimensional (3D) structures such as electron-beam lithography (EBL) attracted attention in various fields. In EBL, an acceleration-voltage modulation method can be used to control the developing depth of the structure. In this study, we fabricated a rose petal structure using acceleration-voltage modulation. Using a rose petal mold, plastic- and silver-duplicated rose petals were prepared using nano-imprint lithography (NIL). We demonstrated that various complex 3D structures and materials can be duplicated using NIL by applying an acceleration-voltage modulation method.

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