Formation Of Two-Dimensional Photonic Crystals With Cavities Arrays In Silicon

2016 ◽  
Vol 11 (1) ◽  
pp. 88-93
Author(s):  
Dmitriy Utkin ◽  
Aleksandr Shklyaev ◽  
Fedor Dultsev ◽  
Aleksandr Latyshev
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Spatial Distributions ◽  
Two Dimensional ◽  
Interference Effects ◽  
Technological Parameters ◽  
Beam Interaction ◽  
Cavity Array ◽  
Better Than

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.

Fast nanopatterning of two-dimensional photonic crystals by electron beam lithography

2004 ◽  
Vol 36 (1-3) ◽  
pp. 265-270 ◽  
Author(s):  
T. Stomeo ◽  
A. Passaseo ◽  
R. Cingolani ◽  
M. De Vittorio
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Two Dimensional

Fabrication of two-dimensional hybrid photonic crystals utilizing electron beam lithography

2005 ◽  
Vol 78-79 ◽  
pp. 442-447 ◽  
Author(s):  
J. Stodolka ◽  
D. Nau ◽  
M. Frommberger ◽  
C. Zanke ◽  
H. Giessen ◽  
...  
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Two Dimensional

A Study of Amorphous Chalcogenides by Electron Microscopy and Analysis

1998 ◽  
Vol 4 (S2) ◽  
pp. 714-715
Author(s):  
A. G. Fitzgerald ◽  
K. Mietzsch
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Diffusion Process ◽  
Electron Beam Lithography ◽  
Interaction Process ◽  
Metal Diffusion ◽  
Process Understanding ◽  
Amorphous Chalcogenides ◽  
Potential Applications ◽  
Beam Interaction

Amorphous chalcogenides films coated with certain metals are known to possess a remarkable sensitivity to radiation. Based on these effects they have found several important applications in the production of microcircuits, e.g. as resists in photo- and electron beam lithography. A variety of chalcogenides in combination with a range of metals has been extensively investigated with regard to potential applications in the fabrication of semiconductor devices.The objectives of the present project are to extend knowledge of the behaviour of amorphous chalcogenides in contact with metals. This includes studying the metal diffusion process, understanding the film-electron beam interaction process and evaluating the potential of the metal lines formed by the electron beam in fabrication of photomasks for the production of higher densities of silicon microcircuits.

An Instructional Two-Dimensional Diffraction Laboratory Using Patterns Created with Electron-Beam Lithography

2002 ◽  
Vol 760 ◽  
Author(s):  
Colin Inglefield ◽  
Royce Anthon
Keyword(s):  
Electron Beam ◽  
Undergraduate Students ◽  
Electron Beam Lithography ◽  
Materials Science ◽  
Reciprocal Lattice ◽  
Real Space ◽  
Two Dimensional ◽  
Solid State Physics ◽  
Modern Physics ◽  
Order Of Magnitude

ABSTRACTAn instructional laboratory in two-dimensional diffraction is discussed. The experiment is appropriate for undergraduate students in materials science, solid-state physics (as was the case with our group), modern physics, or optics. The experiment is performed using visible light from a laser incident on a 2D lattice of gold dots deposited with electron beam lithography on a glass substrate. The pattern is microscopic with a lattice constant on the same order of magnitude as the wavelength of light used. Students observe the diffraction pattern, and then quantitatively determine the positions of maxima. These data are used by the students to reconstruct the (real space) microscopic lattice. The students can simulate the experiment with software that computes reciprocal lattice and diffraction patterns for an arbitrary 2D lattice.

scholarly journals Two-dimensional structures of ferroelectric domain inversion in LiNbO3 by direct electron beam lithography

2003 ◽  
Vol 93 (12) ◽  
pp. 9943-9946 ◽  
Author(s):  
J. He ◽  
S. H. Tang ◽  
Y. Q. Qin ◽  
P. Dong ◽  
H. Z. Zhang ◽  
...  
Keyword(s):  
Electron Beam ◽  
Electron Beam Lithography ◽  
Ferroelectric Domain ◽  
Two Dimensional ◽  
Domain Inversion
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