Utilization of cathodic arc evaporation for the deposition of boron nitride thin films

1997 ◽  
Vol 90 (1-2) ◽  
pp. 178-183 ◽  
Author(s):  
F. Richter ◽  
G. Krannich ◽  
J. Hahn ◽  
R. Pintaske ◽  
M. Friedrich ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

Formation of cubic boron nitride thin films by reactive cathodic arc evaporation

1997 ◽  
Vol 6 (8) ◽  
pp. 1005-1009 ◽  
Author(s):  
G. Krannich ◽  
F. Richter ◽  
J. Hahn ◽  
R. Pintaske ◽  
V.B. Filippo ◽  
...  
Keyword(s):  
Thin Films ◽  
Boron Nitride ◽  
Cubic Boron Nitride ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

Microstructure evolution and age hardening in (Ti,Si)(C,N) thin films deposited by cathodic arc evaporation

2010 ◽  
Vol 519 (4) ◽  
pp. 1397-1403 ◽  
Author(s):  
L.J.S. Johnson ◽  
L. Rogström ◽  
M.P. Johansson ◽  
M. Odén ◽  
L. Hultman
Keyword(s):  
Thin Films ◽  
Microstructure Evolution ◽  
Age Hardening ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

scholarly journals Growth of hard amorphous TiAlSiN thin films by cathodic arc evaporation

2013 ◽  
Vol 235 ◽  
pp. 376-382 ◽  
Author(s):  
H. Fager ◽  
J.M. Andersson ◽  
J. Lu ◽  
M.P. Johansson Jöesaar ◽  
M. Odén ◽  
...  
Keyword(s):  
Thin Films ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc

scholarly journals Detailed characterization of the Ti-O based thin films obtained by cathodic arc evaporation

2021 ◽  
Vol 62 (1) ◽  
pp. 41-50
Author(s):  
Vukoman Jokanović ◽  
Nenad Bundaleski ◽  
Božana Čolović ◽  
Manuela Ferarra ◽  
Bojan Jokanović ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Oxides ◽  
Xps Analysis ◽  
Detailed Characterization ◽  
Extinction Coefficients ◽  
Cathodic Arc Evaporation ◽  
Arc Evaporation ◽  
Cathodic Arc ◽  
Oxidative State

Physicochemical properties of thin films on the base of titanium oxides, obtained by a cathodic arc evaporation on the surface of glass substrate are analysed in details. The analysis of these films was made by using XRD, FTIR, SEM, XPS analysis and ellipsometry. On the basis of these analyses, particularly analysis obtained by XPS, the oxidative state Ti and corresponding phases are determined through various film layers from the surface to the substrate. The depth of the various levels and their extinction coefficients and refractory indexes are estimated by ellipsometry.

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