Evidence for quantum size effects in self-assembled polymer-based heterostructures

1999 ◽  
Vol 102 (1-3) ◽  
pp. 955-956 ◽  
Author(s):  
A.V. Yakimov ◽  
V.N. Savvate'ev ◽  
H. Hong ◽  
D. Davidov
1996 ◽  
Vol 79 (6) ◽  
pp. 3082-3088 ◽  
Author(s):  
H. Hong ◽  
M. Tarabia ◽  
H. Chayet ◽  
D. Davidov ◽  
E. Z. Faraggi ◽  
...  

RSC Advances ◽  
2015 ◽  
Vol 5 (75) ◽  
pp. 61118-61126 ◽  
Author(s):  
Debjit Kar ◽  
Debajyoti Das

In order to facilitate widening in optical band gaps utilizing quantum size-effects, self-assembled Si-ncs embedded in an a-Si matrix were grown within a-Si:H/nc-Si:H superlattice thin films produced by alternating sub-layers of a-Si:H and nc-Si:H.


1991 ◽  
Vol 16 (6) ◽  
pp. 623-638 ◽  
Author(s):  
P.A. Badoz ◽  
F. Arnaud d'Avitaya ◽  
E. Rosencher

1983 ◽  
Vol 44 (C10) ◽  
pp. C10-375-C10-378 ◽  
Author(s):  
P. Ahlqvist ◽  
P. de Andrés ◽  
R. Monreal ◽  
F. Flores

1968 ◽  
Vol 96 (9) ◽  
pp. 61-86 ◽  
Author(s):  
B.A. Tavger ◽  
V.Ya. Demikhovskii

1997 ◽  
Vol 229 (6) ◽  
pp. 401-405 ◽  
Author(s):  
A. Crépieux ◽  
C. Lacroix ◽  
N. Ryzhanova ◽  
A. Vedyayev

2006 ◽  
Vol 100 (11) ◽  
pp. 114905 ◽  
Author(s):  
M. Cattani ◽  
M. C. Salvadori ◽  
A. R. Vaz ◽  
F. S. Teixeira ◽  
I. G. Brown

1993 ◽  
Vol 97 (37) ◽  
pp. 9493-9498 ◽  
Author(s):  
Ladislav Kavan ◽  
Tiziana Stoto ◽  
Michael Graetzel ◽  
Donald Fitzmaurice ◽  
Valery Shklover

1992 ◽  
Vol 283 ◽  
Author(s):  
R. Tsu ◽  
L. Ioriatti ◽  
J. F. Harvey ◽  
H. Shen ◽  
R. A. Lux

ABSTRACTThe reduction of the dielectric constant due to quantum confinement is studied both experimentally and theoretically. Angle resolved ellipsometry measurements with Ar- and He-Ne-lasers give values for the index of refraction far below what can be accounted for from porosity alone. A modified Penn model to include quantum size effects has been used to calculate the reduction in the static dielectric constant (ε) with extreme confinement. Since the binding energy of shallow impurities depends inversely on ε2, the drastic decrease in the carrier concentration as a result of the decrease in ε leads to a self-limiting process for the electrochemical etching of porous silicon.


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