Characterization of zirconia films deposited by r.f. magnetron sputtering

1998 ◽  
Vol 57 (1) ◽  
pp. 28-39 ◽  
Author(s):  
S. Ben Amor ◽  
B. Rogier ◽  
G. Baud ◽  
M. Jacquet ◽  
M. Nardin
Keyword(s):  
Magnetron Sputtering ◽  
Zirconia Films

Characterization of Ti–Zr–V thin films deposited by DC and unipolar pulsed DC magnetron sputtering

Vacuum ◽  
2021 ◽  
Vol 188 ◽  
pp. 110200
Author(s):  
Sihui Wang ◽  
Wei Wei ◽  
Yonghao Gao ◽  
Haibin Pan ◽  
Yong Wang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Pulsed Dc ◽  
Pulsed Dc Magnetron Sputtering

scholarly journals Epitaxial growth and characterization of Cu thin films deposited on Al2O3(0001) substrates by magnetron sputtering

2021 ◽  
pp. 130119
Author(s):  
Ik-Jae Lee ◽  
Hee Seob Kim ◽  
Young Duck Yun ◽  
Seen-Woong Kang ◽  
Hyo-Yun Kim ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Epitaxial Growth

Growth and characterization of device quality ZnO on Si(111) and c-sapphire using a conventional rf magnetron sputtering

2006 ◽  
Vol 17 (2-4) ◽  
pp. 305-310 ◽  
Author(s):  
Byung-Teak Lee ◽  
Sang-Hun Jeong ◽  
Myong-Ho Kim ◽  
Min-Ho Kuk ◽  
Dong-Sik Bae ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering

Synthesis and characterization of Cu3N–WC nanocomposite films prepared by direct current magnetron sputtering

2010 ◽  
Vol 518 (18) ◽  
pp. 5227-5232 ◽  
Author(s):  
Shihong Zhang ◽  
Yinsheng He ◽  
Mingxi Li ◽  
Yizhu He ◽  
Sikchol Kwon ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Nanocomposite Films ◽  
Synthesis And Characterization ◽  
Direct Current Magnetron Sputtering

SUPERCONDUCTING PROPERTIES OF BSCCO (2223) ULTRATHIN FILMS

2002 ◽  
Vol 09 (05n06) ◽  
pp. 1757-1760
Author(s):  
L. NAVARRETE ◽  
A. MARIÑO ◽  
H. SÁNCHEZ
Keyword(s):  
Electrical Properties ◽  
Magnetron Sputtering ◽  
Structural Characterization ◽  
Ultrathin Films ◽  
Rf Magnetron Sputtering ◽  
Ex Situ ◽  
Thermal Treatments ◽  
Superconducting Properties

Ultrathin films of (Bi–Pb)–Sr–Ca–Cu–O (2223) were produced by ex situ RF magnetron sputtering on MgO (100) substrates. Films with different thermal treatments and thickness varying between 30 nm and 300 nm were obtained and studied systematically. A structural characterization of these samples was carried out and correlated with their electrical properties and thickness.

Growth and Characterization of BaBi2Nb2O9Thin Films Made by RF-Magnetron Sputtering

2003 ◽  
Vol 293 (1) ◽  
pp. 201-207
Author(s):  
T. Mazon ◽  
E. Joanni ◽  
J. R. A. Fernandes ◽  
M. A. Zaghete ◽  
M. Cilense ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Rf Magnetron Sputtering
Sign in / Sign up

Export Citation Format

Share Document