Ion beam induced growth of amorphous alloy films in the Co–Nb system during ion beam assisted deposition

2002 ◽  
Vol 335 (1-2) ◽  
pp. 181-187 ◽  
Author(s):  
F Zeng ◽  
F Pan
Keyword(s):  
Amorphous Alloy ◽  
Ion Beam ◽  
Alloy Films ◽  
Ion Beam Assisted Deposition

Microstructures of Nb–Ti alloy films prepared by ion beam assisted deposition

2003 ◽  
Vol 357 (1-2) ◽  
pp. 365-368 ◽  
Author(s):  
F. Zeng ◽  
B. Zhao ◽  
W. Miao ◽  
F. Pan
Keyword(s):  
Ion Beam ◽  
Ti Alloy ◽  
Alloy Films ◽  
Ion Beam Assisted Deposition

Fe-Tb alloy films prepared by ion beam-assisted deposition

2002 ◽  
Vol 14 (8) ◽  
pp. 1775-1784 ◽  
Author(s):  
F Yang ◽  
T He ◽  
F Zeng ◽  
F Pan
Keyword(s):  
Ion Beam ◽  
Alloy Films ◽  
Ion Beam Assisted Deposition

Influence of Ion Beam-Assisted Deposition on the Wetting Properties of Al-1.0 at.% Cr Alloy Films

2019 ◽  
Vol 18 (03n04) ◽  
pp. 1940062
Author(s):  
I. I. Tashlykova-Bushkevich ◽  
J. S. Yakovenko ◽  
I. A. Bushkevich
Keyword(s):  
Surface Roughness ◽  
Sessile Drop ◽  
Ion Beam ◽  
Alloy Films ◽  
Force Microscopy ◽  
Wetting Properties ◽  
Glass Substrates ◽  
Atomic Force ◽  
Ion Beam Assisted Deposition ◽  
Water Wetting

The surface microstructure and wettability of Al-1.0 at.% Cr alloy films obtained by ion-beam-assisted deposition on glass substrates have been investigated using atomic force microscopy, scanning electron microscopy and the sessile drop method. In the passive deposition regime, the surface roughness of the films increased from 8.9[Formula: see text]nm to 21.6[Formula: see text]nm with an increase in coating time from 3[Formula: see text]h to 9[Formula: see text]h. A quantitative analysis of the morphology evolution of the films during their growth was performed. The results revealed that Al-1.0 at.% Cr alloy films are hydrophilic. The mechanism of heterogeneous water wetting of Al-1.0 at.% Cr alloy films was considered, when the increasing surface roughness accounts for a decrease of hydrophilicity.

B(1−x)Nx Alloy Films Prepared by Ion Beam Assisted Deposition

1988 ◽  
Vol 128 ◽  
Author(s):  
C. A. Carosella ◽  
G. K. Hubler ◽  
D. Van Vechten ◽  
E. P. Donovan
Keyword(s):  
Refractive Index ◽  
Ion Beam ◽  
Hexagonal Phase ◽  
Arrival Rate ◽  
Sticking Coefficient ◽  
Broad Absorption ◽  
Alloy Films ◽  
Ion Beam Assisted Deposition ◽  
Knoop Microhardness ◽  
Refractive Index Data

ABSTRACTWe have produced alloy films of B(1−x)Nx (x:0 to 0.5) via ion beam assisted deposition (IBAD). Rutherford backscattering spectroscopy (RBS) measurements show that the stoichiometric films are achieved with a nitrogen to boron atom arrival rate of N/B = 2.55. The film N/B ratio for all measured compositions is fit with a model that predicts that the nitrogen sticking coefficient is 0.36. Measurements of B(1−x)Nx film thicknesses with a profilometer confirm the value of this sticking coefficient. The BN film is transparent and has an refractive index that varies between 1.90 and 1.77 in the range 400 nm to 3100 nm. The refractive index data can be fit with the Sellmeier equation. Films 500 run thick with N/B less than 0.6 appear metallic; the index decreases linearly with increasing nitrogen content. The films have two broad absorption peaks, centered at 750 cm−1 and 1370 cm−1 that correspond to BN vibrations. The characteristics of the bands suggest that the films are amorphous or a microcrystalline hexagonal phase. The Knoop microhardness of the films generally decrease with increasing N content. Stoichiometric films have a microhardness of Hk = 20 GPa, measured with a 25 gm load.

Plasmonic properties of titanium nitride thin films prepared by ion beam assisted deposition

2016 ◽  
Vol 185 ◽  
pp. 295-298 ◽  
Author(s):  
Lin-Ao Zhang ◽  
Hao-Nan Liu ◽  
Xiao-Xia Suo ◽  
Shuo Tong ◽  
Ying-Lan Li ◽  
...  
Keyword(s):  
Thin Films ◽  
Titanium Nitride ◽  
Ion Beam ◽  
Ion Beam Assisted Deposition
Sign in / Sign up

Export Citation Format

Share Document