An experimental study of photoresist material etching by an atmospheric-pressure plasma jet with Ar/air mixed gas

2013 ◽  
Vol 79 (5) ◽  
pp. 683-689 ◽  
Author(s):  
LIJUN WANG ◽  
WENJUN NING ◽  
MINGZHENG FU ◽  
CHEN WU ◽  
SHENLI JIA

AbstractIn this paper, electrical and optical emission spectrometer (OES) characteristics of an Ar/air atmospheric-pressure plasma jet (APPJ) based on the plasma needle and plasma pencil systems were investigated and analyzed. Electrical measurement results showed that the breakdown and working voltage of the jet increased with the increase of the ratio of air/Ar, and the emission intensity of Ar* significantly decreased. For the plasma needle, when the ratio of air/Ar reached 1, the OES characteristics of Ar/air were similar to those of air plasma, and the main excited species was N2*. For the plasma pencil, when a little air impurity was added in Ar, the emission intensities of N2* species will be significantly increased. Based on these two APPJ systems, photoresist materials were etched, etched results showed that the etched surface was easier to be oxidized with the addition of air into Ar. The etched surface was cleaner with pure Ar plasma with scanning substrate methods than that with the Ar/air mixture. Etched results of higher ratios of air/Ar plasma were similar to those of air plasma.

Micromachines ◽  
2021 ◽  
Vol 12 (6) ◽  
pp. 683
Author(s):  
Huiliang Jin ◽  
Caixue Tang ◽  
Haibo Li ◽  
Yuanhang Zhang ◽  
Yaguo Li

The continuous phase plate (CPP) is the vital diffractive optical element involved in laser beam shaping and smoothing in high-power laser systems. The high gradients, small spatial periods, and complex features make it difficult to achieve high accuracy when manufacturing such systems. A high-accuracy and high-efficiency surface topography manufacturing method for CPP is presented in this paper. The atmospheric pressure plasma jet (APPJ) system is presented and the removal characteristics are studied to obtain the optimal processing parameters. An optimized iterative algorithm based on the dwell point matrix and a fast Fourier transform (FFT) is proposed to improve the accuracy and efficiency in the dwell time calculation process. A 120 mm × 120 mm CPP surface topography with a 1326.2 nm peak-to-valley (PV) value is fabricated with four iteration steps after approximately 1.6 h of plasma processing. The residual figure error between the prescribed surface topography and plasma-processed surface topography is 28.08 nm root mean square (RMS). The far-field distribution characteristic of the plasma-fabricated surface is analyzed, for which the energy radius deviation is 11 μm at 90% encircled energy. The experimental results demonstrates the potential of the APPJ approach for the manufacturing of complex surface topographies.


2019 ◽  
Vol 675 ◽  
pp. 34-42 ◽  
Author(s):  
Md. Mokter Hossain ◽  
Quang Hung Trinh ◽  
Duc Ba Nguyen ◽  
M.S.P. Sudhakaran ◽  
Young Sun Mok

2016 ◽  
Vol 14 (7) ◽  
pp. 1600067 ◽  
Author(s):  
Tao Wang ◽  
Bin Yang ◽  
Xiang Chen ◽  
Xiaolin Wang ◽  
Chunsheng Yang ◽  
...  

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