Tensile Creep of Y-Si3N4: II. Cavitation

Author(s):  
B. J. Hockey ◽  
S. M. Wiederhorn

ATEM has been used to characterize three different silicon nitride materials after tensile creep in air at 1200 to 1400° C. In Part I, the microstructures and microstructural changes that occur during testing were described, and consistent with that description the designations and sintering aids for these materials were: W/YAS, a SiC whisker reinforced Si3N4 processed with yttria (6w/o) and alumina (1.5w/o); YAS, Si3N4 processed with yttria (6 w/o) and alumina (1.5w/o); and YS, Si3N4 processed with yttria (4.0 w/o). This paper, Part II, addresses the interfacial cavitation processes that occur in these materials and which are ultimately responsible for creep rupture.

1993 ◽  
Vol 89-91 ◽  
pp. 569-574 ◽  
Author(s):  
Tatsuki Ohji ◽  
Y. Yamauchi ◽  
Shuzo Kanzaki

1999 ◽  
Vol 5 (S2) ◽  
pp. 778-779
Author(s):  
R.W Carpenter ◽  
W Braue ◽  
M.J. Kim

Lath-like silicon oxynitride crystals have often been observed in the microstructure of silicon nitride based ceramics after processing. They are usually located in glassy regions which are siliceous solidified sintering aid liquid, and usually contain a small (∼100nm) a-Si3N4 crystal. These nitride crystals are considered to be seeds, incompletely dissolved in the melt, that are heterogeneous nucleation sites for the oxynitride crystals. We present here the first observations of morphological and crystallographic habits between the seed nanocrystals and the host oxynitride laths.Fig. 1 shows a typical oxynitride lath containing a nitride seed crystal. The lath is surrounded by glass and ß-Si3N4 particles, and a small cristobalite particle (a minor constituent). This microstructure is from an Si02-Si3N4 ceramic processed with Al2O3 sintering aid. The same oxynitride lath/seed structures were observed when other sintering aids (eg. Y2O3, MgO, ZrO2) were used, so they are independent of sintering aid.


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