Analysis of moiré patterns in images of thin YBa2Cu3O7-δ films on MgO
Moiré fringes arise from the interference between diffracted beams from two overlapping crystals (double diffraction) and in the bright-field case the forward scattered beam. The fringe patterns act as magnifiers of lattice imperfections and small deviations from perfect crystallographic orientation and symmetry. Moiré patterns have been used previously to study, for example, the growth of metal films on substrates such as molybdenum disulfide—which can easily be prepared to electron transparency. Moiré patterns can be used to identify microstructural defects in epitactic deposits. For example, the presence of rotationally misaligned grains, the presence of dislocations, and residual interfacial strain will be revealed in the fringe pattern.