Atomic Layer Deposition of Zirconium Titanium Oxide from Titanium Isopropoxide and Zirconium Chloride

2001 ◽  
Vol 13 (5) ◽  
pp. 1528-1532 ◽  
Author(s):  
Antti Rahtu ◽  
Mikko Ritala ◽  
Markku Leskelä
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Atomic Layer ◽  
Titanium Isopropoxide ◽  
Layer Deposition

Retention of Surface Structure Causes Lower Density in Atomic Layer Deposition of Amorphous Titanium Oxide Thin Films

2021 ◽  
Author(s):  
Benjamin Rich ◽  
Yael Etinger-Geller ◽  
G. Ciatto ◽  
A Katsman ◽  
Boaz Pokroy
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Surface Structure ◽  
Titanium Oxide ◽  
Size Effects ◽  
Atomic Layer ◽  
Tio2 Films ◽  
Structural Modifications ◽  
Layer Deposition ◽  
Amorphous Tio2

Size effects and structural modifications in amorphous TiO2 films deposited by atomic layer deposition (ALD) were investigated. As with the previously investigated ALD-deposited Al2O3 system we found that the film’s...

Effects of Chlorine in Titanium Oxide on Palladium Atomic Layer Deposition

2014 ◽  
Vol 118 (39) ◽  
pp. 22611-22619 ◽  
Author(s):  
Yu Lei ◽  
Bin Liu ◽  
Junling Lu ◽  
Joseph A. Libera ◽  
Jeffrey P. Greeley ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Atomic Layer ◽  
Layer Deposition

scholarly journals Nucleation and Initial Stages of Growth during the Atomic Layer Deposition of Titanium Oxide on Mesoporous Silica

Nano Letters ◽  
2020 ◽  
Vol 20 (9) ◽  
pp. 6884-6890
Author(s):  
Wang Ke ◽  
Yang Liu ◽  
Xuelong Wang ◽  
Xiangdong Qin ◽  
Limei Chen ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Mesoporous Silica ◽  
Titanium Oxide ◽  
Atomic Layer ◽  
Stages Of Growth ◽  
Layer Deposition

scholarly journals Quantum size effects in TiO2 thin films grown by atomic layer deposition

2014 ◽  
Vol 5 ◽  
pp. 77-82 ◽  
Author(s):  
Massimo Tallarida ◽  
Chittaranjan Das ◽  
Dieter Schmeisser
Keyword(s):  
Atomic Layer Deposition ◽  
Size Effects ◽  
Carrier Transport ◽  
Atomic Layer ◽  
Titanium Isopropoxide ◽  
Quantum Size Effects ◽  
Tio2 Thin Films ◽  
Quantum Size ◽  
Layer Deposition ◽  
Energy Conversion Systems

We study the atomic layer deposition of TiO2 by means of X-ray absorption spectroscopy. The Ti precursor, titanium isopropoxide, was used in combination with H2O on Si/SiO2 substrates that were heated at 200 °C. The low growth rate (0.15 Å/cycle) and the in situ characterization permitted to follow changes in the electronic structure of TiO2 in the sub-nanometer range, which are influenced by quantum size effects. The modified electronic properties may play an important role in charge carrier transport and separation, and increase the efficiency of energy conversion systems.

Atomic Layer Deposition of Titanium Oxide from TiI4 and H2O2

2000 ◽  
Vol 6 (6) ◽  
pp. 303-310 ◽  
Author(s):  
K. Kukli ◽  
M. Ritala ◽  
M. Schuisky ◽  
M. Leskelä ◽  
T. Sajavaara ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Atomic Layer ◽  
Layer Deposition

Atomic Layer Deposition of Platinum Nanoparticles on Titanium Oxide and Tungsten Oxide Using Platinum(II) Hexafluoroacetylacetonate and Formalin as the Reactants

2014 ◽  
Vol 118 (17) ◽  
pp. 8960-8970 ◽  
Author(s):  
Virginia R. Anderson ◽  
Noemi Leick ◽  
Joel W. Clancey ◽  
Katherine E. Hurst ◽  
Kim M. Jones ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Tungsten Oxide ◽  
Titanium Oxide ◽  
Platinum Nanoparticles ◽  
Atomic Layer ◽  
Layer Deposition ◽  
And Tungsten

Growth of Titanium Oxide Nanostructures on γ-Аl2О3 by Atomic Layer Deposition

2020 ◽  
Vol 56 (12) ◽  
pp. 1234-1241
Author(s):  
A. A. Malkov ◽  
Yu. A. Kukushkina ◽  
E. A. Sosnov ◽  
A. A. Malygin
Keyword(s):  
Atomic Layer Deposition ◽  
Titanium Oxide ◽  
Atomic Layer ◽  
Oxide Nanostructures ◽  
Layer Deposition
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