Intrinsic Amorphous Silicon (a-Si:H) Thin Film Prepared by Using Remote Plasma Chemical Vapor Deposition Method and Used as a Passivation Layer for a Heterojunction Solar Cell

Solar Cell ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Cited By ~ 5

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Thin Films ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Cited By ~ 5

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Cited By ~ 11

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Novel plasma chemical vapor deposition method of carbon nanotubes at low temperature for field emission display application

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00475-1 ◽

2001 ◽

Vol 10 (2) ◽

pp. 248-253 ◽

Cited By ~ 19

Author(s):

Suk Jae Chung ◽

Sung Hoon Lim ◽

Choong Hun Lee ◽

Jin Jang

Keyword(s):

Carbon Nanotubes ◽

Low Temperature ◽

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Field Emission Display ◽

Plasma Chemical ◽

Preparation of PbTiO3 films by sputter assisted plasma chemical vapor deposition method.

Shinku ◽

10.3131/jvsj.32.341 ◽

1989 ◽

Vol 32 (3) ◽

pp. 341-344

Author(s):

Shoichi MOCHIZUKI ◽

Saburo KIMURA ◽

Tadashi ISHIDA ◽

Ryoji MAKABE

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

Influences of Melamine Flow Rate on the Growth Behavior of Nanocrystalline Diamond Films by Direct Current Plasma Chemical Vapor Deposition Method

IOP Conference Series Materials Science and Engineering ◽

10.1088/1757-899x/678/1/012166 ◽

2019 ◽

Vol 678 ◽

pp. 012166

Author(s):

Chunlei Wu ◽

Yanfeng Liu ◽

Guodong Hao ◽

Ruihua Zhu

Keyword(s):

Vapor Deposition ◽

Diamond Films ◽

Chemical Vapor ◽

Growth Behavior ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Direct Current Plasma

Preparation of PbTiO3Thin Films by Sputter Assisted Plasma Chemical Vapor Deposition Method

10.7567/jjaps.28s2.15 ◽

1989 ◽

Vol 28 (S2) ◽

pp. 15 ◽

Cited By ~ 4

Author(s):

Shoichi Mochizuki ◽

Saburo Kimura ◽

Ryoji Makabe

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Deposition Method ◽

Plasma Chemical ◽

The structural and surface properties of carbon nanotube synthesized by microwave plasma chemical vapor deposition method for superhydrophobic coating

Thin Solid Films ◽

10.1016/j.tsf.2013.05.018 ◽

2013 ◽

Vol 546 ◽

pp. 94-97 ◽

Cited By ~ 13

Author(s):

Jae-Hyeong Lee ◽

Su Ho Lee ◽

Doyoung Kim ◽

Yong Seob Park

Keyword(s):

Carbon Nanotube ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Deposition Method ◽

Superhydrophobic Coating ◽

Plasma Chemical ◽

Electrical conductive hard-carbon (diamond-like carbon) films formed by i-C4H10/N2 supermagnetron plasma chemical vapor deposition method

Thin Solid Films ◽

10.1016/s0040-6090(00)01091-9 ◽

2000 ◽

Vol 373 (1-2) ◽

pp. 251-254 ◽

Cited By ~ 9

Author(s):

Haruhisa Kinoshita ◽

Jun Takahashi ◽

Takuya Hando

Keyword(s):

Vapor Deposition ◽

Chemical Vapor ◽

Carbon Films ◽

Diamond Like Carbon ◽

Deposition Method ◽

Hard Carbon ◽

Plasma Chemical ◽

Formation of Carbon Nitride Films by the Radio-Frequency Plasma Chemical Vapor Deposition Method

10.1143/jjap.36.4893 ◽

1997 ◽

Vol 36 (Part 1, No. 7B) ◽

pp. 4893-4896 ◽

Cited By ~ 17

Author(s):

Mei Zhang ◽

Ping Wang ◽

Yoshikazu Nakayama

Keyword(s):

Vapor Deposition ◽

Carbon Nitride ◽

Chemical Vapor ◽

Radio Frequency Plasma ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition ◽

Frequency Plasma